Silicon-silicon interaction in bis(silylene)iron, disilanyliron, and bis(silyl)iron complexes

Keiji Ueno, Hiromi Tobita, Hiroshi Ogino

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

29Si NMR coupling constants in a disilanyliron complex CpFe(CO)2SiMe2SiMe(OtBu)2 (1: CP = η5C5H5), a bis(silylene)iron complex Cp(OC)Fe{SiMe2 ⋯ O(tBu) ⋯ SiMeOtBu)} (2), and a cis-bis(silyl)iron complex (OC)4Fe{SiMe2CH2CH2SiMePh} (3) were measured by the INEPT-INADE-QUATE technique. The coupling constant for 2 (28.6 Hz) is much smaller than that for 1 (128 Hz) with a direct Si-Si bond, but larger than that for 3 (2.7 Hz) where there is no direct Si-Si bond. Model calculations using the extended Hückel method indicate that there is no direct bond between the two silicon atoms in the bis(silylene)iron complex Cp(OC)Fe{SiH2 ⋯ O(H) ⋯ SiH2}. This means that the coupling in 2 can be described as the sum of the two geminal couplings, 2J(SiFeSi) and 2J(SiOSi).

Original languageEnglish
Pages (from-to)93-104
Number of pages12
JournalJournal of Organometallic Chemistry
Volume430
Issue number1
DOIs
Publication statusPublished - 1992 Jun 2

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