Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces

M. Sasaki; Y. Akatu; I. Li; Kazuhiro Hane

doi:10.1109/IMNC.2000.872671

Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces

M. Sasaki, Y. Akatu, I. Li, Kazuhiro Hane

ENG - Finemechanics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this study, a new fabrication method of the solid polymer dye microlaser is described using the Si mold having the optically smooth side walls. For preparing the optically smooth surfaces, the characteristics of the anisotropic etching is utilized. The narrow peaks which can be attributed to morphology dependent resonances of a hexagonal polymer replica of the Si mold are observed.

Original language	English
Title of host publication	Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	152-153
Number of pages	2
ISBN (Print)	4891140046, 9784891140045
DOIs	https://doi.org/10.1109/IMNC.2000.872671
Publication status	Published - 2000
Event	International Microprocesses and Nanotechnology Conference, MNC 2000 - Tokyo, Japan Duration: 2000 Jul 11 → 2000 Jul 13

Other

Other	International Microprocesses and Nanotechnology Conference, MNC 2000
Country/Territory	Japan
City	Tokyo
Period	00/7/11 → 00/7/13

ASJC Scopus subject areas

Biotechnology
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials

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10.1109/IMNC.2000.872671

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Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces. / Sasaki, M.; Akatu, Y.; Li, I. et al.
Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000. Institute of Electrical and Electronics Engineers Inc., 2000. p. 152-153 872671.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Sasaki, M, Akatu, Y, Li, I & Hane, K 2000, Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces. in Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000., 872671, Institute of Electrical and Electronics Engineers Inc., pp. 152-153, International Microprocesses and Nanotechnology Conference, MNC 2000, Tokyo, Japan, 00/7/11. https://doi.org/10.1109/IMNC.2000.872671

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title = "Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces",

abstract = "In this study, a new fabrication method of the solid polymer dye microlaser is described using the Si mold having the optically smooth side walls. For preparing the optically smooth surfaces, the characteristics of the anisotropic etching is utilized. The narrow peaks which can be attributed to morphology dependent resonances of a hexagonal polymer replica of the Si mold are observed.",

author = "M. Sasaki and Y. Akatu and I. Li and Kazuhiro Hane",

year = "2000",

doi = "10.1109/IMNC.2000.872671",

language = "English",

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booktitle = "Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000",

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TY - GEN

T1 - Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces

AU - Sasaki, M.

AU - Akatu, Y.

AU - Li, I.

AU - Hane, Kazuhiro

PY - 2000

Y1 - 2000

N2 - In this study, a new fabrication method of the solid polymer dye microlaser is described using the Si mold having the optically smooth side walls. For preparing the optically smooth surfaces, the characteristics of the anisotropic etching is utilized. The narrow peaks which can be attributed to morphology dependent resonances of a hexagonal polymer replica of the Si mold are observed.

AB - In this study, a new fabrication method of the solid polymer dye microlaser is described using the Si mold having the optically smooth side walls. For preparing the optically smooth surfaces, the characteristics of the anisotropic etching is utilized. The narrow peaks which can be attributed to morphology dependent resonances of a hexagonal polymer replica of the Si mold are observed.

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U2 - 10.1109/IMNC.2000.872671

DO - 10.1109/IMNC.2000.872671

M3 - Conference contribution

AN - SCOPUS:84952067199

SN - 4891140046

SN - 9784891140045

SP - 152

EP - 153

BT - Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - International Microprocesses and Nanotechnology Conference, MNC 2000

Y2 - 11 July 2000 through 13 July 2000

ER -

Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces

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