TY - JOUR
T1 - Spin-valve giant magnetoresistive films with antiferromagnetic Ir-Mn layers
AU - Fuke, Hiromi Niu
AU - Saito, Kazuhiro
AU - Kamiguchi, Yuzo
AU - Iwasaki, Hitoshi
AU - Sahashi, Masashi
PY - 1997/4/15
Y1 - 1997/4/15
N2 - We succeeded in developing CoFe spin valves with an antiferromagnetic Ir-Mn film. Ir-Mn single-layer films and spin valves of Ta(5 nm)/Ir-Mn(8 or 9 nm)/Co90Fe10(x nm)/Cu(3 nm)/ Co90Fe10(S nm)/NiFe(2 nm)/CoZrNb(10 nm)/(or = 2, 2.3, 2.6 nm). prepared by the sputtering method, showed the crystal structure of a fcc (111) preferred orientation. As-deposited CoFe spin valves with Ir-Mn exhibited an interfacial exchange coupling energy of J = 0.192 erg/cm2 (Hua ∼ 640 Oe at tCoFe = 2 nm), that was the highest ever reported for as-deposited antiferromagnetic films, such as NiO, NiMn, and FeMn. Furthermore, CoFe spin valves with Ir-Mn exhibited a higher blocking temperature of 260 °C, and a higher MR ratio of 6.37% than the spin valves with FeMn film. After annealing, the MR ratio increased to 7.82%. On the other hand, the Hua decreased about 100 Oe after annealing. The Hua-T curve was, however, improved and the Hua at 100 °C increased to 400 Oe. The decrease in Hua was not observed after second annealing and seems to be stabilized by first annealing.
AB - We succeeded in developing CoFe spin valves with an antiferromagnetic Ir-Mn film. Ir-Mn single-layer films and spin valves of Ta(5 nm)/Ir-Mn(8 or 9 nm)/Co90Fe10(x nm)/Cu(3 nm)/ Co90Fe10(S nm)/NiFe(2 nm)/CoZrNb(10 nm)/(or = 2, 2.3, 2.6 nm). prepared by the sputtering method, showed the crystal structure of a fcc (111) preferred orientation. As-deposited CoFe spin valves with Ir-Mn exhibited an interfacial exchange coupling energy of J = 0.192 erg/cm2 (Hua ∼ 640 Oe at tCoFe = 2 nm), that was the highest ever reported for as-deposited antiferromagnetic films, such as NiO, NiMn, and FeMn. Furthermore, CoFe spin valves with Ir-Mn exhibited a higher blocking temperature of 260 °C, and a higher MR ratio of 6.37% than the spin valves with FeMn film. After annealing, the MR ratio increased to 7.82%. On the other hand, the Hua decreased about 100 Oe after annealing. The Hua-T curve was, however, improved and the Hua at 100 °C increased to 400 Oe. The decrease in Hua was not observed after second annealing and seems to be stabilized by first annealing.
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M3 - Article
AN - SCOPUS:0000987770
SN - 0021-8979
VL - 81
SP - 4004
EP - 4006
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 8 PART 2A
ER -