Stack structure dependence of Co/Ni multilayer for current-induced domain wall motion

Shunsuke Fukami; Tetsuhiro Suzuki; Hironobu Tanigawa; Norikazu Ohshima; Nobuyuki Ishiwata

doi:10.1143/APEX.3.113002

Stack structure dependence of Co/Ni multilayer for current-induced domain wall motion

Shunsuke Fukami, Tetsuhiro Suzuki, Hironobu Tanigawa, Norikazu Ohshima, Nobuyuki Ishiwata

RIEC - Computing System Platforms Division

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33 Citations (Scopus)

Abstract

We developed a film stack structure of Co/Ni with perpendicular magnetic anisotropy (PMA), which is suitable for current-induced domain wall (DW) motion. A Ta/Pt underlayer effectively provided a sufficiently large PMA to achieve the DW motion driven by a small current. The critical current density ( j _c) had a minimum value at a Pt underlayer thickness (t_UL) of 2.4nm and was insensitive to cap layer thickness (t_cap). The dependence of j_c on t_UL and t_cap can be accounted for in terms of the effective spin polarization.

Original language	English
Article number	113002
Journal	Applied Physics Express
Volume	3
Issue number	11
DOIs	https://doi.org/10.1143/APEX.3.113002
Publication status	Published - 2010 Nov

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@article{6ade1b5f578b4e8499e4c3dc179bbb3e,

title = "Stack structure dependence of Co/Ni multilayer for current-induced domain wall motion",

abstract = "We developed a film stack structure of Co/Ni with perpendicular magnetic anisotropy (PMA), which is suitable for current-induced domain wall (DW) motion. A Ta/Pt underlayer effectively provided a sufficiently large PMA to achieve the DW motion driven by a small current. The critical current density ( j c) had a minimum value at a Pt underlayer thickness (tUL) of 2.4nm and was insensitive to cap layer thickness (tcap). The dependence of jc on tUL and tcap can be accounted for in terms of the effective spin polarization.",

author = "Shunsuke Fukami and Tetsuhiro Suzuki and Hironobu Tanigawa and Norikazu Ohshima and Nobuyuki Ishiwata",

year = "2010",

month = nov,

doi = "10.1143/APEX.3.113002",

language = "English",

volume = "3",

journal = "Applied Physics Express",

issn = "1882-0778",

publisher = "Japan Society of Applied Physics",

number = "11",

}

TY - JOUR

T1 - Stack structure dependence of Co/Ni multilayer for current-induced domain wall motion

AU - Fukami, Shunsuke

AU - Suzuki, Tetsuhiro

AU - Tanigawa, Hironobu

AU - Ohshima, Norikazu

AU - Ishiwata, Nobuyuki

PY - 2010/11

Y1 - 2010/11

N2 - We developed a film stack structure of Co/Ni with perpendicular magnetic anisotropy (PMA), which is suitable for current-induced domain wall (DW) motion. A Ta/Pt underlayer effectively provided a sufficiently large PMA to achieve the DW motion driven by a small current. The critical current density ( j c) had a minimum value at a Pt underlayer thickness (tUL) of 2.4nm and was insensitive to cap layer thickness (tcap). The dependence of jc on tUL and tcap can be accounted for in terms of the effective spin polarization.

AB - We developed a film stack structure of Co/Ni with perpendicular magnetic anisotropy (PMA), which is suitable for current-induced domain wall (DW) motion. A Ta/Pt underlayer effectively provided a sufficiently large PMA to achieve the DW motion driven by a small current. The critical current density ( j c) had a minimum value at a Pt underlayer thickness (tUL) of 2.4nm and was insensitive to cap layer thickness (tcap). The dependence of jc on tUL and tcap can be accounted for in terms of the effective spin polarization.

UR - http://www.scopus.com/inward/record.url?scp=78549277471&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78549277471&partnerID=8YFLogxK

U2 - 10.1143/APEX.3.113002

DO - 10.1143/APEX.3.113002

M3 - Article

AN - SCOPUS:78549277471

SN - 1882-0778

VL - 3

JO - Applied Physics Express

JF - Applied Physics Express

IS - 11

M1 - 113002

ER -

Stack structure dependence of Co/Ni multilayer for current-induced domain wall motion

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