STM study of the reactivity of niobium diselenide in air and N2

S. Antoranz Contera, T. Yoshinobu, H. Iwasaki, K. Kisoda, S. Nakashima

Research output: Contribution to journalConference articlepeer-review

6 Citations (Scopus)

Abstract

STM has been used to investigate the variety of processes taking place in the surface of NbSe2 in air and N2. Induced surface layer by layer etching and formation and evolution of surface reaction sites both in air and N2, are discussed. Residues removed and transported by the tip were found in N2 but they seemed to get dissolved in air. Rests of chemicals (and/or surface defects) have been observed to be left in the edges of pre-existing terrace steps in N2, providing a preferential place for the formation of new reaction sites when air was re-introduced. In places where apparently no defects were present, the tip induced etching process was not possible, but focusing in a pre-existing small depression, the etching proceeded fast not only in that layer but also in the layers beneath. We propose that the processes taking place at the surface of NbSe2 are due to mechanical and chemical interactions that unsaturated bonds which are present in surface defects and step edges have with the environment and the tip.

Original languageEnglish
Pages (from-to)623-628
Number of pages6
JournalApplied Surface Science
Volume130-132
DOIs
Publication statusPublished - 1998
EventProceedings of the 1997 4th International Symposium on Atomically Controlled Surfaces and Intefaces, ACSI-4 - Tokyo, Jpn
Duration: 1997 Oct 271997 Oct 30

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