Structural and magnetic properties of Co2MnSi heusler alloy thin films on Si

Muhammad Ariful Islam Nahid; Mikihiko Ogane; Hiroshi Naganuma; Yasuo Ando

doi:10.1143/JJAP.48.083002

Structural and magnetic properties of Co₂MnSi heusler alloy thin films on Si

Muhammad Ariful Islam Nahid, Mikihiko Ogane, Hiroshi Naganuma, Yasuo Ando

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

The structural and magnetic properties of Co₂MnSi thin films grown on n-doped Si(110) and Si(100) substrates were studied and observed to have a strong dependence on annealing temperature (T_A). At T _A = 275-350^°C, the Co₂MnSi films exhibited the B2 phase with a (100) orientation and a magnetic moment on both substrates. The saturation magnetization (M_S) of Co₂MnSi thin films was observed to reach a maximum at T_A = 300^°C, above which it was found to decrease. We consider that at T_A ≃ 300^°C, the Co₂MnSi thin films on Si substrates exhibited the (100) orientation, a high M_S and a low roughness which might promote spin injection.

Original language	English
Pages (from-to)	830021-830023
Number of pages	3
Journal	Japanese journal of applied physics
Volume	48
Issue number	8 Part 1
DOIs	https://doi.org/10.1143/JJAP.48.083002
Publication status	Published - 2009 Dec 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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abstract = "The structural and magnetic properties of Co2MnSi thin films grown on n-doped Si(110) and Si(100) substrates were studied and observed to have a strong dependence on annealing temperature (TA). At T A = 275-350°C, the Co2MnSi films exhibited the B2 phase with a (100) orientation and a magnetic moment on both substrates. The saturation magnetization (MS) of Co2MnSi thin films was observed to reach a maximum at TA = 300°C, above which it was found to decrease. We consider that at TA ≃ 300°C, the Co2MnSi thin films on Si substrates exhibited the (100) orientation, a high MS and a low roughness which might promote spin injection.",

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T1 - Structural and magnetic properties of Co2MnSi heusler alloy thin films on Si

AU - Nahid, Muhammad Ariful Islam

AU - Ogane, Mikihiko

AU - Naganuma, Hiroshi

AU - Ando, Yasuo

PY - 2009/12/1

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N2 - The structural and magnetic properties of Co2MnSi thin films grown on n-doped Si(110) and Si(100) substrates were studied and observed to have a strong dependence on annealing temperature (TA). At T A = 275-350°C, the Co2MnSi films exhibited the B2 phase with a (100) orientation and a magnetic moment on both substrates. The saturation magnetization (MS) of Co2MnSi thin films was observed to reach a maximum at TA = 300°C, above which it was found to decrease. We consider that at TA ≃ 300°C, the Co2MnSi thin films on Si substrates exhibited the (100) orientation, a high MS and a low roughness which might promote spin injection.

AB - The structural and magnetic properties of Co2MnSi thin films grown on n-doped Si(110) and Si(100) substrates were studied and observed to have a strong dependence on annealing temperature (TA). At T A = 275-350°C, the Co2MnSi films exhibited the B2 phase with a (100) orientation and a magnetic moment on both substrates. The saturation magnetization (MS) of Co2MnSi thin films was observed to reach a maximum at TA = 300°C, above which it was found to decrease. We consider that at TA ≃ 300°C, the Co2MnSi thin films on Si substrates exhibited the (100) orientation, a high MS and a low roughness which might promote spin injection.

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Structural and magnetic properties of Co₂MnSi heusler alloy thin films on Si

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