Structural and optical characterization of high-quality cubic GaN epilayers grown on GaAs and 3C-SiC substrates by gas-source MBE using RHEED in situ monitoring

H. Ohumura, K. Balakrishnan, G. Feuillet, K. Ohta, H. Hamaguchi, S. Chichibu, Y. Ishida, S. Yoshida

Research output: Contribution to journalConference articlepeer-review

17 Citations (Scopus)

Abstract

By monitoring RHEED reconstruction patterns during gas source molecular beam epitaxy growth, the optimization of the growth for cubic GaN was carried out successfully. Cubic GaN epilayer having a X-ray diffraction width of 16min and a low temperature photoluminescence emission width of 19meV was obtained on a 3C-SiC substrate by adjusting the effective III/V ratio in-situ during the growth, which can be inferred from the surface reconstruction transitions. It was found that the surface reconstructions of cubic GaN surfaces are good indices for the optimization of growth parameters.

Original languageEnglish
Pages (from-to)435-440
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume449
Publication statusPublished - 1997
EventProceedings of the 1996 MRS Fall Symposium - Boston, MA, USA
Duration: 1996 Dec 21996 Dec 5

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