TY - JOUR
T1 - Structural and reactive kinetics in gas-liquid interfacial plasmas
AU - Kaneko, T.
AU - Chen, Q.
AU - Harada, T.
AU - Hatakeyama, R.
PY - 2011/6
Y1 - 2011/6
N2 - Basic physical and chemical processes in novel gas-liquid interfacial plasmas applicable to nano-bio conjugates creation are investigated, where the boundary between ionic liquids (ILs) and gas phase discharge plasmas plays a key role. First the electrostatic potential is found to be formed at the plasma-liquid interface, and the precise potential and density structures are clearly measured. Then gas-liquid discharge kinetics, namely the dynamic behaviors of ions and electrons, are clarified in gas pressures ranging from atmospheric to low pressures owing to the unique properties of the ILs. Finally kinetics of interface reactions such as IL dissociation promoted by the plasma irradiation through the electric field just above the IL are explored, which enables us to create innovative conjugates of carbon nanotubes and nanoparticles.
AB - Basic physical and chemical processes in novel gas-liquid interfacial plasmas applicable to nano-bio conjugates creation are investigated, where the boundary between ionic liquids (ILs) and gas phase discharge plasmas plays a key role. First the electrostatic potential is found to be formed at the plasma-liquid interface, and the precise potential and density structures are clearly measured. Then gas-liquid discharge kinetics, namely the dynamic behaviors of ions and electrons, are clarified in gas pressures ranging from atmospheric to low pressures owing to the unique properties of the ILs. Finally kinetics of interface reactions such as IL dissociation promoted by the plasma irradiation through the electric field just above the IL are explored, which enables us to create innovative conjugates of carbon nanotubes and nanoparticles.
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U2 - 10.1088/0963-0252/20/3/034014
DO - 10.1088/0963-0252/20/3/034014
M3 - Article
AN - SCOPUS:79957703228
SN - 0963-0252
VL - 20
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 3
M1 - 034014
ER -