Structural study of Ti O2 -based transparent conducting films

T. Hitosugi; N. Yamada; S. Nakao; K. Hatabayashi; T. Shimada; T. Hasegawa

doi:10.1116/1.2944260

Structural study of Ti O2 -based transparent conducting films

T. Hitosugi, N. Yamada, S. Nakao, K. Hatabayashi, T. Shimada, T. Hasegawa

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

We have investigated microscopic structures of sputter and pulsed laser deposited (PLD) anatase Nb-doped Ti O2 transparent conducting films, and discuss what causes the degradation of resistivity in sputter-deposited films. Cross-sectional transmission electron microscope and polarized optical microscope images show inhomogeneous intragrain structures and small grains of ∼10 μm in sputter-deposited films. From comparison with PLD films, these results suggest that homogeneous film growth is the important factor to obtain highly conducting sputter-deposited film.

Original language	English
Pages (from-to)	1027-1029
Number of pages	3
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	26
Issue number	4
DOIs	https://doi.org/10.1116/1.2944260
Publication status	Published - 2008

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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AU - Hitosugi, T.

AU - Yamada, N.

AU - Nakao, S.

AU - Hatabayashi, K.

AU - Shimada, T.

AU - Hasegawa, T.

PY - 2008

Y1 - 2008

N2 - We have investigated microscopic structures of sputter and pulsed laser deposited (PLD) anatase Nb-doped Ti O2 transparent conducting films, and discuss what causes the degradation of resistivity in sputter-deposited films. Cross-sectional transmission electron microscope and polarized optical microscope images show inhomogeneous intragrain structures and small grains of ∼10 μm in sputter-deposited films. From comparison with PLD films, these results suggest that homogeneous film growth is the important factor to obtain highly conducting sputter-deposited film.

AB - We have investigated microscopic structures of sputter and pulsed laser deposited (PLD) anatase Nb-doped Ti O2 transparent conducting films, and discuss what causes the degradation of resistivity in sputter-deposited films. Cross-sectional transmission electron microscope and polarized optical microscope images show inhomogeneous intragrain structures and small grains of ∼10 μm in sputter-deposited films. From comparison with PLD films, these results suggest that homogeneous film growth is the important factor to obtain highly conducting sputter-deposited film.

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Structural study of Ti O2 -based transparent conducting films

Abstract

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