Abstract
Thin CdxZn1-xS films have been deposited on Si(100), GaAs (100) and fused silica substrates at low pressure in the temperature range of 473-673 K by remote plasma enhanced chemical vapor deposition (RPECVD) using Cd/Zn(S2CN(C2H5)2) 2·C10H8N2 as single-source precursor. The influence of deposition conditions on physical and chemical properties of the films has been studied by ellipsometry, IR- and Raman spectroscopies, SEM, HREM, SAED, EDS and X-ray diffraction using synchrotron radiation. The zinc and cadmium concentration gradient along the film thickness was observed. The CdxZn1-xS film is substitution solid solution with hexagonal texture structure.
Original language | English |
---|---|
Pages (from-to) | Pr3979-Pr3985 |
Journal | Journal De Physique. IV : JP |
Volume | 11 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2001 |
Event | 13th European Conference on Chemical Vapor Deposition (EUROCVD 13) - Athens, Greece Duration: 2001 Aug 26 → 2001 Aug 31 |