Structure study of thin RPECVD Cd_xZn_1-xS films

Material Science

• Plasma-Enhanced Chemical Vapor Deposition 100%
• Film 50%
• Silicon Dioxide 50%
• X-Ray Diffraction 50%
• Temperature 50%
• Physical Property 50%
• Solid Solution 50%
• Scanning Electron Microscopy 50%
• Film Thickness 50%
• Raman Spectroscopy 50%
• Gallium Arsenide 50%
• Infrared Spectroscopy 50%
• Chemical Property 50%
• Energy-Dispersive X-Ray Spectroscopy 50%
• Selected Area Diffraction 50%
• Cadmium 50%
• High-Resolution Episcopic Microscopy 50%

Chemistry

• Liquid Film 100%
• Structure 100%
• Thickness 20%
• Concentration 20%
• Reaction Temperature 20%
• Pressure 20%
• Substitution Reaction 20%
• Crystalline Texture 20%
• X-Ray Diffraction 20%
• Solid Solution 20%
• Synchrotron Radiation 20%
• Scanning Electron Microscopy 20%
• Physical Property 20%
• Chemical Property 20%
• Ellipsometry 20%
• Cadmia 20%