Study on fabrication of titanium oxide films by oxygen pressure controlled pulsed laser deposition

Takahiro Nakamura; Eiichiro Matsubara; Nobuaki Sato; Atsushi Muramatsu; Hideyuki Takahashi

doi:10.2320/matertrans.45.2068

Study on fabrication of titanium oxide films by oxygen pressure controlled pulsed laser deposition

Takahiro Nakamura, Eiichiro Matsubara, Nobuaki Sato, Atsushi Muramatsu, Hideyuki Takahashi

Tohoku University

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10 ^-6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO₂. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

Original language	English
Pages (from-to)	2068-2072
Number of pages	5
Journal	Materials Transactions
Volume	45
Issue number	7
DOIs	https://doi.org/10.2320/matertrans.45.2068
Publication status	Published - 2004 Jul

Keywords

Grazing incidence X-ray scattering (GIXS)
Pulsed laser deposition (PLD)
Thin film
Titanium oxide
X-ray reflection

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10.2320/matertrans.45.2068

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@article{614181218ade44eb978ec63a62292340,

title = "Study on fabrication of titanium oxide films by oxygen pressure controlled pulsed laser deposition",

abstract = "Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10 -6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO2. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.",

keywords = "Grazing incidence X-ray scattering (GIXS), Pulsed laser deposition (PLD), Thin film, Titanium oxide, X-ray reflection",

author = "Takahiro Nakamura and Eiichiro Matsubara and Nobuaki Sato and Atsushi Muramatsu and Hideyuki Takahashi",

year = "2004",

month = jul,

doi = "10.2320/matertrans.45.2068",

language = "English",

volume = "45",

pages = "2068--2072",

journal = "Materials Transactions",

issn = "1345-9678",

publisher = "Japan Institute of Metals (JIM)",

number = "7",

}

TY - JOUR

T1 - Study on fabrication of titanium oxide films by oxygen pressure controlled pulsed laser deposition

AU - Nakamura, Takahiro

AU - Matsubara, Eiichiro

AU - Sato, Nobuaki

AU - Muramatsu, Atsushi

AU - Takahashi, Hideyuki

PY - 2004/7

Y1 - 2004/7

N2 - Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10 -6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO2. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

AB - Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10 -6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO2. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

KW - Grazing incidence X-ray scattering (GIXS)

KW - Pulsed laser deposition (PLD)

KW - Thin film

KW - Titanium oxide

KW - X-ray reflection

UR - http://www.scopus.com/inward/record.url?scp=4544286962&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4544286962&partnerID=8YFLogxK

U2 - 10.2320/matertrans.45.2068

DO - 10.2320/matertrans.45.2068

M3 - Article

AN - SCOPUS:4544286962

SN - 1345-9678

VL - 45

SP - 2068

EP - 2072

JO - Materials Transactions

JF - Materials Transactions

IS - 7

ER -

Study on fabrication of titanium oxide films by oxygen pressure controlled pulsed laser deposition

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