Sub 100 nm lithography based on plasmon polariton resonance

Xiangang Luo; T. Ishihara

doi:10.1109/IMNC.2003.1268614

Sub 100 nm lithography based on plasmon polariton resonance

Xiangang Luo, T. Ishihara

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

9 Citations (Scopus)

Abstract

We propose a new approach named plasmon parallel nanolithography that can potentially produce sub-wavelength structures efficiently using coherent illumination of standard photoresist with ultraviolet or visible light.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	138-139
Number of pages	2
ISBN (Electronic)	4891140402, 9784891140403
DOIs	https://doi.org/10.1109/IMNC.2003.1268614
Publication status	Published - 2003
Externally published	Yes
Event	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan Duration: 2003 Oct 29 → 2003 Oct 31

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Other

Other	International Microprocesses and Nanotechnology Conference, MNC 2003
Country/Territory	Japan
City	Tokyo
Period	03/10/29 → 03/10/31

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

Access to Document

10.1109/IMNC.2003.1268614

Cite this

Luo, X., & Ishihara, T. (2003). Sub 100 nm lithography based on plasmon polariton resonance. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 138-139). [1268614] (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268614

Sub 100 nm lithography based on plasmon polariton resonance. / Luo, Xiangang; Ishihara, T.
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 138-139 1268614 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Luo, X & Ishihara, T 2003, Sub 100 nm lithography based on plasmon polariton resonance. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268614, Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, Institute of Electrical and Electronics Engineers Inc., pp. 138-139, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 03/10/29. https://doi.org/10.1109/IMNC.2003.1268614

Luo X, Ishihara T. Sub 100 nm lithography based on plasmon polariton resonance. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 138-139. 1268614. (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). doi: 10.1109/IMNC.2003.1268614

Luo, Xiangang ; Ishihara, T. / Sub 100 nm lithography based on plasmon polariton resonance. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 138-139 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

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abstract = "We propose a new approach named plasmon parallel nanolithography that can potentially produce sub-wavelength structures efficiently using coherent illumination of standard photoresist with ultraviolet or visible light.",

author = "Xiangang Luo and T. Ishihara",

note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",

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Sub 100 nm lithography based on plasmon polariton resonance

Abstract

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ASJC Scopus subject areas

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