Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

Research output: Contribution to conferencePaperpeer-review

2 Citations (Scopus)

Abstract

The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.

Original languageEnglish
PagesI186-I187
Publication statusPublished - 2001
Event4th Pacific Rim Conference on Lasers and Electro-Optics - Chiba, Japan
Duration: 2001 Jul 152001 Jul 19

Conference

Conference4th Pacific Rim Conference on Lasers and Electro-Optics
Country/TerritoryJapan
CityChiba
Period01/7/1501/7/19

Fingerprint

Dive into the research topics of 'Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching'. Together they form a unique fingerprint.

Cite this