Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths

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27 Citations (Scopus)


We fabricated a two-dimensional subwavelength grating (SWG) on a GaSb substrate. The SWG was patterned by electronbeam lithography and etched by a fast atom beam with SF6 and Cl2 gases. The SWG consisted of tapered gratings with a 350-nm-period and a 1280-nm-deep groove. The reflectivity at wavelengths from 500 nm to 2300 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis (RCWA). At wavelengths from 500 nm to 2000 nm, the SWG decreased the reflection as much as 5 to 10% from the original value of approximately 40% of the GaSb substrate. The thermal stability of the SWG was also studied by measuring the reflection spectra of heated samples.

Original languageEnglish
Pages (from-to)4020-4023
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number6 B
Publication statusPublished - 2003 Jun


  • Antireflection
  • Fast atom beam
  • Rigorous coupled-wave analysis
  • Subwavelength gratings

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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