Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths

Yoshiaki Kanamori; Ken Ichi Kobayashi; Hiroo Yugami; Kazuhiro Hane

doi:10.1143/jjap.42.4020

Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths

Yoshiaki Kanamori, Ken Ichi Kobayashi, Hiroo Yugami, Kazuhiro Hane

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

We fabricated a two-dimensional subwavelength grating (SWG) on a GaSb substrate. The SWG was patterned by electronbeam lithography and etched by a fast atom beam with SF₆ and Cl₂ gases. The SWG consisted of tapered gratings with a 350-nm-period and a 1280-nm-deep groove. The reflectivity at wavelengths from 500 nm to 2300 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis (RCWA). At wavelengths from 500 nm to 2000 nm, the SWG decreased the reflection as much as 5 to 10% from the original value of approximately 40% of the GaSb substrate. The thermal stability of the SWG was also studied by measuring the reflection spectra of heated samples.

Original language	English
Pages (from-to)	4020-4023
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	42
Issue number	6 B
DOIs	https://doi.org/10.1143/jjap.42.4020
Publication status	Published - 2003 Jun

Keywords

Antireflection
Fast atom beam
Rigorous coupled-wave analysis
Subwavelength gratings

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/jjap.42.4020

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title = "Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths",

abstract = "We fabricated a two-dimensional subwavelength grating (SWG) on a GaSb substrate. The SWG was patterned by electronbeam lithography and etched by a fast atom beam with SF6 and Cl2 gases. The SWG consisted of tapered gratings with a 350-nm-period and a 1280-nm-deep groove. The reflectivity at wavelengths from 500 nm to 2300 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis (RCWA). At wavelengths from 500 nm to 2000 nm, the SWG decreased the reflection as much as 5 to 10% from the original value of approximately 40% of the GaSb substrate. The thermal stability of the SWG was also studied by measuring the reflection spectra of heated samples.",

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author = "Yoshiaki Kanamori and Kobayashi, {Ken Ichi} and Hiroo Yugami and Kazuhiro Hane",

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T1 - Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths

AU - Kanamori, Yoshiaki

AU - Kobayashi, Ken Ichi

AU - Yugami, Hiroo

AU - Hane, Kazuhiro

PY - 2003/6

Y1 - 2003/6

N2 - We fabricated a two-dimensional subwavelength grating (SWG) on a GaSb substrate. The SWG was patterned by electronbeam lithography and etched by a fast atom beam with SF6 and Cl2 gases. The SWG consisted of tapered gratings with a 350-nm-period and a 1280-nm-deep groove. The reflectivity at wavelengths from 500 nm to 2300 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis (RCWA). At wavelengths from 500 nm to 2000 nm, the SWG decreased the reflection as much as 5 to 10% from the original value of approximately 40% of the GaSb substrate. The thermal stability of the SWG was also studied by measuring the reflection spectra of heated samples.

AB - We fabricated a two-dimensional subwavelength grating (SWG) on a GaSb substrate. The SWG was patterned by electronbeam lithography and etched by a fast atom beam with SF6 and Cl2 gases. The SWG consisted of tapered gratings with a 350-nm-period and a 1280-nm-deep groove. The reflectivity at wavelengths from 500 nm to 2300 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis (RCWA). At wavelengths from 500 nm to 2000 nm, the SWG decreased the reflection as much as 5 to 10% from the original value of approximately 40% of the GaSb substrate. The thermal stability of the SWG was also studied by measuring the reflection spectra of heated samples.

KW - Antireflection

KW - Fast atom beam

KW - Rigorous coupled-wave analysis

KW - Subwavelength gratings

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 6 B

ER -

Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths

Abstract

Keywords

ASJC Scopus subject areas

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