Subwavelength antireflection gratings for photovoltaic cells in visible and near-infrared wavelengths

Y. Kanamori, K. Kobayashi, H. Yugami, K. Hane

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Citations (Scopus)

Abstract

In this study, we have fabricated a two-dimensional antireflection subwavelength grating (SWG) on a GaSb substratefor application to a photovoltaic cell. The SWG has consisted of 350 nm period tapered grating. In the fabrication, electron beam (EB) lithography and fast atom beam (FAB) etching have been used. We have demonstrated that the SWG works well for reducing the reflection even at the temperature of 240°C. To our knowledge, the SWG is fabricated on the GaSb substrate for the first time.

Original languageEnglish
Title of host publication2002 International Microprocesses and Nanotechnology Conference, MNC 2002
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages182-183
Number of pages2
ISBN (Electronic)4891140313, 9784891140311
DOIs
Publication statusPublished - 2002
EventInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
Duration: 2002 Nov 62002 Nov 8

Publication series

Name2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2002
Country/TerritoryJapan
CityTokyo
Period02/11/602/11/8

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