Abstract
We succeeded in growing a high-quality single crystal of URu 2Si2 by the Czochralski pulling method and applying the solid state electro-transport method under ultrahigh vacuum. The sample quality strongly depends on the position in the ingot. For some parts of this ingot, the electrical resistivity, specific heat and de Haas-van Alplhen effect were measured. The electrical resistivity of the surface sample clearly indicates a T-linear temperature dependence below 5 K. The mean free path in this sample was determined by the de Haas-van Alphen effect to be 11000 Å.
Original language | English |
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Pages (from-to) | 362-364 |
Number of pages | 3 |
Journal | Journal of the Physical Society of Japan |
Volume | 77 |
Issue number | SUPPL.A |
DOIs | |
Publication status | Published - 2008 |
Keywords
- dHvA
- Electrical resistivity
- URuSi