@inproceedings{9b5cf4bfa5b946e4b599dfc239c11d74,
title = "Suppression of electron emission from cathode in photoemission-assisted Ar plasma",
abstract = "In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.",
keywords = "Langmuir probe, photoemission-assisted plasma, spave charge effect",
author = "N. Kamata and S. Ajia and S. Ogawa and Y. Takakuwa",
note = "Funding Information: ACKNOWLEDGMENT This work was supported by JSPS KAKENHI Grant Number JP16K14124. Publisher Copyright: {\textcopyright} 2018 IEEE.; 31st International Vacuum Nanoelectronics Conference, IVNC 2018 ; Conference date: 09-07-2018 Through 13-07-2018",
year = "2018",
month = nov,
day = "1",
doi = "10.1109/IVNC.2018.8520275",
language = "English",
series = "2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018",
address = "United States",
}