@inproceedings{57625928e04f47d2bdc3b38d87ed28e1,
title = "Surface flattening of poly-Si thin films by laser annealing and electrical properties of LTPS-TFTs",
abstract = "Low-temperature poly-Si (LTPS) thin films formed by excimer laser annealing (ELA) are used as the channel material for thin film transistors (TFTs), which have an application as switching devices in flat panel displays. It is well known that one of the major problems in TFT manufacturing is the prominent ridges that form on LTPS thin films after ELA due to volume expansion by crystallization, which in turn induces gate leakage current in the TFTs. In this presentation, we report on the use of additional laser irradiation to reduce the height of the ridges and resulting changes in the electrical properties of LTPS-TFTs.",
keywords = "Excimer-laser annealing, Flat panel displays, Low-temperature poly-Si, Surface flattening, Thin-film transistors",
author = "Fuminobu Hamano and Akira Mizutani and Kaname Imokawa and Daisuke Nakamura and Tetsuya Goto and Hiroshi Ikenoue",
note = "Publisher Copyright: {\textcopyright} COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.; Laser-Based Micro- and Nanoprocessing XIV 2020 ; Conference date: 03-02-2020 Through 06-02-2020",
year = "2020",
doi = "10.1117/12.2544910",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Udo Klotzbach and Akira Watanabe and Rainer Kling",
booktitle = "Laser-Based Micro- and Nanoprocessing XIV",
}