Synchrotron radiation induced reactions of condensed layer of organosilicon compounds

Michio Niwano; Jun Ichi Sawahata; Taka Aki Miura; Daisei Shoji; Nobuo Miyamoto

doi:10.1016/0368-2048(96)02929-5

Synchrotron radiation induced reactions of condensed layer of organosilicon compounds

Michio Niwano, Jun Ichi Sawahata, Taka Aki Miura, Daisei Shoji, Nobuo Miyamoto

Research output: Contribution to journal › Article › peer-review

Abstract

We have studied the synchrotron radiation (SR) induced chemical reactions of condensed layers of silicon alkoxides, Si(OCH₃)₄ and Si(OC₂H₅)₄, and tetramethylsilane Si(CH₃)₄ on a Si substrate at 80 K. Photon-stimulated desorption (PSD) measurements show that irradiation with SR in the vacuum-ultraviolet (VUV) region initiates the desorption of H₂, hydrocarbons, and CO from the condensed layer, indicating that VUV-SR decomposes the alkoxyl and methyl groups of the organosilicon compounds. It is found that the kinetics of desorption of CO differs from that of hydrogen and hydrocarbons. Infrared and photoemission data demonstrate that Si-containing fragments produced by the decomposition of organosilicon molecules are polymerized to generate SiO₂ and amorphous SiC.

Original language	English
Pages (from-to)	89-92
Number of pages	4
Journal	Journal of Electron Spectroscopy and Related Phenomena
Volume	80
DOIs	https://doi.org/10.1016/0368-2048(96)02929-5
Publication status	Published - 1996 May
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Radiation
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Spectroscopy
Physical and Theoretical Chemistry

Access to Document

10.1016/0368-2048(96)02929-5

Cite this

@article{8a409f26aed844f8b5c13779a15556e5,

title = "Synchrotron radiation induced reactions of condensed layer of organosilicon compounds",

abstract = "We have studied the synchrotron radiation (SR) induced chemical reactions of condensed layers of silicon alkoxides, Si(OCH3)4 and Si(OC2H5)4, and tetramethylsilane Si(CH3)4 on a Si substrate at 80 K. Photon-stimulated desorption (PSD) measurements show that irradiation with SR in the vacuum-ultraviolet (VUV) region initiates the desorption of H2, hydrocarbons, and CO from the condensed layer, indicating that VUV-SR decomposes the alkoxyl and methyl groups of the organosilicon compounds. It is found that the kinetics of desorption of CO differs from that of hydrogen and hydrocarbons. Infrared and photoemission data demonstrate that Si-containing fragments produced by the decomposition of organosilicon molecules are polymerized to generate SiO2 and amorphous SiC.",

author = "Michio Niwano and Sawahata, {Jun Ichi} and Miura, {Taka Aki} and Daisei Shoji and Nobuo Miyamoto",

year = "1996",

month = may,

doi = "10.1016/0368-2048(96)02929-5",

language = "English",

volume = "80",

pages = "89--92",

journal = "Journal of Electron Spectroscopy and Related Phenomena",

issn = "0368-2048",

publisher = "Elsevier",

}

TY - JOUR

T1 - Synchrotron radiation induced reactions of condensed layer of organosilicon compounds

AU - Niwano, Michio

AU - Sawahata, Jun Ichi

AU - Miura, Taka Aki

AU - Shoji, Daisei

AU - Miyamoto, Nobuo

PY - 1996/5

Y1 - 1996/5

N2 - We have studied the synchrotron radiation (SR) induced chemical reactions of condensed layers of silicon alkoxides, Si(OCH3)4 and Si(OC2H5)4, and tetramethylsilane Si(CH3)4 on a Si substrate at 80 K. Photon-stimulated desorption (PSD) measurements show that irradiation with SR in the vacuum-ultraviolet (VUV) region initiates the desorption of H2, hydrocarbons, and CO from the condensed layer, indicating that VUV-SR decomposes the alkoxyl and methyl groups of the organosilicon compounds. It is found that the kinetics of desorption of CO differs from that of hydrogen and hydrocarbons. Infrared and photoemission data demonstrate that Si-containing fragments produced by the decomposition of organosilicon molecules are polymerized to generate SiO2 and amorphous SiC.

AB - We have studied the synchrotron radiation (SR) induced chemical reactions of condensed layers of silicon alkoxides, Si(OCH3)4 and Si(OC2H5)4, and tetramethylsilane Si(CH3)4 on a Si substrate at 80 K. Photon-stimulated desorption (PSD) measurements show that irradiation with SR in the vacuum-ultraviolet (VUV) region initiates the desorption of H2, hydrocarbons, and CO from the condensed layer, indicating that VUV-SR decomposes the alkoxyl and methyl groups of the organosilicon compounds. It is found that the kinetics of desorption of CO differs from that of hydrogen and hydrocarbons. Infrared and photoemission data demonstrate that Si-containing fragments produced by the decomposition of organosilicon molecules are polymerized to generate SiO2 and amorphous SiC.

UR - http://www.scopus.com/inward/record.url?scp=0007919714&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0007919714&partnerID=8YFLogxK

U2 - 10.1016/0368-2048(96)02929-5

DO - 10.1016/0368-2048(96)02929-5

M3 - Article

AN - SCOPUS:0007919714

SN - 0368-2048

VL - 80

SP - 89

EP - 92

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

ER -

Synchrotron radiation induced reactions of condensed layer of organosilicon compounds

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this