Ta-doped anatase TiO2 epitaxial film as transparent conducting oxide

Taro Hitosugi, Yutaka Furubayashi, Atsuki Ueda, Kinnosuke Itabashi, Kazuhisa Inaba, Yasushi Hirose, Go Kinoda, Yukio Yamamoto, Toshihiro Shimada, Tetsuya Hasegawa

Research output: Contribution to journalArticlepeer-review

149 Citations (Scopus)


We present electrical transport and optical properties of Ta-doped TiO 2 epitaxial thin films with varying Ta concentration grown by the pulsed laser deposition method. The Ti0.95Ta0.05O 2 film exhibited a resistivity of 2.5 × 10-4 Ωcm at room temperature, and an internal transmittance of 95% in the visible light region. These values are comparable to those of a widely used transparent conducting oxide (TCO), indium tin oxide. Furthermore, this new material falls into a new category of TCOs that utilizes d electrons.

Original languageEnglish
Pages (from-to)L1063-L1065
JournalJapanese Journal of Applied Physics, Part 2: Letters
Issue number33-36
Publication statusPublished - 2005 Aug 26
Externally publishedYes


  • Epitaxial
  • Pulsed laser deposition
  • Thin film
  • TiO
  • Transparent conducting oxide

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


Dive into the research topics of 'Ta-doped anatase TiO2 epitaxial film as transparent conducting oxide'. Together they form a unique fingerprint.

Cite this