TY - JOUR
T1 - Tailoring material properties of electrochemically deposited Al film from chloroaluminate ionic liquid for microsystem technology using pulsed deposition
AU - Al Farisi, Muhammad Salman
AU - Tsukamoto, Takashiro
AU - Tanaka, Shuji
N1 - Funding Information:
This study was supported by Japan Society for the Promotion of Science (JSPS) KAKENHI grant-in-aid for young scientist no. 19J11122 and the Division for Interdisciplinary Advanced Research and Education, Tohoku University. The authors acknowledge Dr. Takamichi Miyazaki from the Department of Instrumental Analysis, Graduate School of Engineering, Tohoku University for his assistance in EBSD analysis. The authors also acknowledge Mr. Masatoshi Tanno from the New Industry Creation Hatchery Center (NICHe), Tohoku University for his assistance in nanoindentation testing. A part of the experiments were performed in the Micro/Nano Machining Research and Education Center (MNC), Tohoku University.
Funding Information:
This study was supported by Japan Society for the Promotion of Science (JSPS) KAKENHI grant-in-aid for young scientist no. 19J11122 and the Division for Interdisciplinary Advanced Research and Education, Tohoku University. The authors acknowledge Dr. Takamichi Miyazaki from the Department of Instrumental Analysis, Graduate School of Engineering, Tohoku University for his assistance in EBSD analysis. The authors also acknowledge Mr. Masatoshi Tanno from the New Industry Creation Hatchery Center (NICHe), Tohoku University for his assistance in nanoindentation testing. A part of the experiments were performed in the Micro/Nano Machining Research and Education Center (MNC), Tohoku University.
Publisher Copyright:
© 2020 Elsevier B.V.
PY - 2020/12/1
Y1 - 2020/12/1
N2 - To practically utilize an electrochemically deposited Al film in microsystems, its material properties have to be elucidated, along with the influence of different deposition conditions. In this study, microstructure, electrical, mechanical and thermal properties of electrochemically deposited Al film from a chloroaluminate ionic liquid electrolyte are comprehensively investigated. The nanoindentation hardness and elastic modulus of the film varied between 486–908 MPa and 41–102 GPa, respectively, depending on the deposition condition. The electrical resistivity and the coefficient of thermal expansion varied between 51–160 nΩ m and 2–20 ppm/K, respectively. The results are compared to those of Al thin films deposited using other techniques. The characterized properties were found to be associated to the microstuctures of the deposits, which can be tailored by the deposition conditions. The microstructures of the deposits were comprehensively characterized by cross-sectional scanning electron microscope (SEM) and electron backscatter diffraction (EBSD) spectroscopy. These results are useful as a design guide for the future applications of the film.
AB - To practically utilize an electrochemically deposited Al film in microsystems, its material properties have to be elucidated, along with the influence of different deposition conditions. In this study, microstructure, electrical, mechanical and thermal properties of electrochemically deposited Al film from a chloroaluminate ionic liquid electrolyte are comprehensively investigated. The nanoindentation hardness and elastic modulus of the film varied between 486–908 MPa and 41–102 GPa, respectively, depending on the deposition condition. The electrical resistivity and the coefficient of thermal expansion varied between 51–160 nΩ m and 2–20 ppm/K, respectively. The results are compared to those of Al thin films deposited using other techniques. The characterized properties were found to be associated to the microstuctures of the deposits, which can be tailored by the deposition conditions. The microstructures of the deposits were comprehensively characterized by cross-sectional scanning electron microscope (SEM) and electron backscatter diffraction (EBSD) spectroscopy. These results are useful as a design guide for the future applications of the film.
KW - Aluminum
KW - Chloroaluminate
KW - Design guide
KW - Electrochemical deposition
KW - Ionic liquid
KW - Recurrent galvanic pulse plating
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U2 - 10.1016/j.sna.2020.112384
DO - 10.1016/j.sna.2020.112384
M3 - Article
AN - SCOPUS:85095716277
SN - 0924-4247
VL - 316
JO - Sensors and Actuators A: Physical
JF - Sensors and Actuators A: Physical
M1 - 112384
ER -