Texture and orientation characteristics of α-Al2O3 films prepared by laser chemical vapor deposition using Nd:YAG laser

Akihiko Ito; Hokuto Kadokura; Teiichi Kimura; Takashi Goto

doi:10.1016/j.jallcom.2009.09.088

Texture and orientation characteristics of α-Al₂O₃ films prepared by laser chemical vapor deposition using Nd:YAG laser

Akihiko Ito, Hokuto Kadokura, Teiichi Kimura, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

61 Citations (Scopus)

Abstract

α-Al₂O₃ films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (T_vap), total chamber pressure (P_tot), laser power (P_L) and deposition temperature (T_dep) on the phase, orientation and texture of Al₂O₃ film were investigated. At P_tot = 0.93 kPa, α-Al₂O₃ films were obtained in the region of T_vap > 423 K and T_dep > 1100 K. The orientation of α-Al₂O₃ film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing P_tot. Porous α-Al₂O₃ films were formed at high T_vap (443 K) and low P_tot (0.47 kPa). At T_vap = 413 K, α-Al₂O₃ film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing P_tot = 0.93-1.4 kPa, (0 0 6)-oriented α-Al₂O₃ film with a hexagonal terrace texture was obtained.

Original language	English
Pages (from-to)	469-474
Number of pages	6
Journal	Journal of Alloys and Compounds
Volume	489
Issue number	2
DOIs	https://doi.org/10.1016/j.jallcom.2009.09.088
Publication status	Published - 2010 Jan 21

Keywords

Alumina
Coating
Laser CVD
Microstructure
Orientation

ASJC Scopus subject areas

Mechanics of Materials
Mechanical Engineering
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.jallcom.2009.09.088

Cite this

@article{189b21a92ac34a8dace43c9f618c0796,

title = "Texture and orientation characteristics of α-Al2O3 films prepared by laser chemical vapor deposition using Nd:YAG laser",

abstract = "α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (Tvap), total chamber pressure (Ptot), laser power (PL) and deposition temperature (Tdep) on the phase, orientation and texture of Al2O3 film were investigated. At Ptot = 0.93 kPa, α-Al2O3 films were obtained in the region of Tvap > 423 K and Tdep > 1100 K. The orientation of α-Al2O3 film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing Ptot. Porous α-Al2O3 films were formed at high Tvap (443 K) and low Ptot (0.47 kPa). At Tvap = 413 K, α-Al2O3 film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing Ptot = 0.93-1.4 kPa, (0 0 6)-oriented α-Al2O3 film with a hexagonal terrace texture was obtained.",

keywords = "Alumina, Coating, Laser CVD, Microstructure, Orientation",

author = "Akihiko Ito and Hokuto Kadokura and Teiichi Kimura and Takashi Goto",

note = "Funding Information: This research was supported in part by the Global COE Program of Materials Integration, Tohoku University, and by the Asian CORE Program, Japan Society for the Promotion of Science (JSPS). This research was also performed as part of the Rare Metal Substitute Materials Development Project of the New Energy and Industrial Technology Development Organization (NEDO). Copyright: Copyright 2009 Elsevier B.V., All rights reserved.",

year = "2010",

month = jan,

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doi = "10.1016/j.jallcom.2009.09.088",

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T1 - Texture and orientation characteristics of α-Al2O3 films prepared by laser chemical vapor deposition using Nd:YAG laser

AU - Ito, Akihiko

AU - Kadokura, Hokuto

AU - Kimura, Teiichi

AU - Goto, Takashi

N1 - Funding Information: This research was supported in part by the Global COE Program of Materials Integration, Tohoku University, and by the Asian CORE Program, Japan Society for the Promotion of Science (JSPS). This research was also performed as part of the Rare Metal Substitute Materials Development Project of the New Energy and Industrial Technology Development Organization (NEDO). Copyright: Copyright 2009 Elsevier B.V., All rights reserved.

PY - 2010/1/21

Y1 - 2010/1/21

N2 - α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (Tvap), total chamber pressure (Ptot), laser power (PL) and deposition temperature (Tdep) on the phase, orientation and texture of Al2O3 film were investigated. At Ptot = 0.93 kPa, α-Al2O3 films were obtained in the region of Tvap > 423 K and Tdep > 1100 K. The orientation of α-Al2O3 film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing Ptot. Porous α-Al2O3 films were formed at high Tvap (443 K) and low Ptot (0.47 kPa). At Tvap = 413 K, α-Al2O3 film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing Ptot = 0.93-1.4 kPa, (0 0 6)-oriented α-Al2O3 film with a hexagonal terrace texture was obtained.

AB - α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (Tvap), total chamber pressure (Ptot), laser power (PL) and deposition temperature (Tdep) on the phase, orientation and texture of Al2O3 film were investigated. At Ptot = 0.93 kPa, α-Al2O3 films were obtained in the region of Tvap > 423 K and Tdep > 1100 K. The orientation of α-Al2O3 film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing Ptot. Porous α-Al2O3 films were formed at high Tvap (443 K) and low Ptot (0.47 kPa). At Tvap = 413 K, α-Al2O3 film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing Ptot = 0.93-1.4 kPa, (0 0 6)-oriented α-Al2O3 film with a hexagonal terrace texture was obtained.

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KW - Laser CVD

KW - Microstructure

KW - Orientation

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