The corrosion behavior of sputter-deposited amorphous WTi alloys in 6 M HCl solution

J. Bhattarai; E. Akiyama; A. Kawashima; K. Asami; K. Hashimoto

doi:10.1016/0010-938X(95)00120-9

The corrosion behavior of sputter-deposited amorphous WTi alloys in 6 M HCl solution

J. Bhattarai, E. Akiyama, A. Kawashima, K. Asami, K. Hashimoto

IMR - Materials Design Division

Tohoku University

Research output: Contribution to journal › Article › peer-review

38 Citations (Scopus)

Abstract

Amorphous WTi alloys were successfully prepared by DC magnetron sputtering in a wide composition range. The sputter deposited WTi alloys thus prepared were spontaneously passive, and their corrosion rates were lower than tungsten and about two orders of magnitude lower than titanium in 6 M HCl solution open to air at 30 °C. XPS analysis showed that tungsten was enriched in both the passive films and underlying alloy surfaces in 6 M HCl solution. The passive films on the WTi alloys were composed of a double oxyhydroxide of tetravalent tungsten and titanium ions. The formation of the double oxyhydroxide film seems responsible for high corrosion resistance of the alloys in comparison with alloying constituents in 6 M HCl at 30 °C.

Original language	English
Pages (from-to)	2071-2086
Number of pages	16
Journal	Corrosion Science
Volume	37
Issue number	12
DOIs	https://doi.org/10.1016/0010-938X(95)00120-9
Publication status	Published - 1995 Dec

Access to Document

10.1016/0010-938X(95)00120-9

Cite this

@article{a4c11186791245e6b5da655dc4bfdb1d,

title = "The corrosion behavior of sputter-deposited amorphous WTi alloys in 6 M HCl solution",

abstract = "Amorphous WTi alloys were successfully prepared by DC magnetron sputtering in a wide composition range. The sputter deposited WTi alloys thus prepared were spontaneously passive, and their corrosion rates were lower than tungsten and about two orders of magnitude lower than titanium in 6 M HCl solution open to air at 30 °C. XPS analysis showed that tungsten was enriched in both the passive films and underlying alloy surfaces in 6 M HCl solution. The passive films on the WTi alloys were composed of a double oxyhydroxide of tetravalent tungsten and titanium ions. The formation of the double oxyhydroxide film seems responsible for high corrosion resistance of the alloys in comparison with alloying constituents in 6 M HCl at 30 °C.",

author = "J. Bhattarai and E. Akiyama and A. Kawashima and K. Asami and K. Hashimoto",

year = "1995",

month = dec,

doi = "10.1016/0010-938X(95)00120-9",

language = "English",

volume = "37",

pages = "2071--2086",

journal = "Corrosion Science",

issn = "0010-938X",

publisher = "Elsevier Ltd.",

number = "12",

}

TY - JOUR

T1 - The corrosion behavior of sputter-deposited amorphous WTi alloys in 6 M HCl solution

AU - Bhattarai, J.

AU - Akiyama, E.

AU - Kawashima, A.

AU - Asami, K.

AU - Hashimoto, K.

PY - 1995/12

Y1 - 1995/12

N2 - Amorphous WTi alloys were successfully prepared by DC magnetron sputtering in a wide composition range. The sputter deposited WTi alloys thus prepared were spontaneously passive, and their corrosion rates were lower than tungsten and about two orders of magnitude lower than titanium in 6 M HCl solution open to air at 30 °C. XPS analysis showed that tungsten was enriched in both the passive films and underlying alloy surfaces in 6 M HCl solution. The passive films on the WTi alloys were composed of a double oxyhydroxide of tetravalent tungsten and titanium ions. The formation of the double oxyhydroxide film seems responsible for high corrosion resistance of the alloys in comparison with alloying constituents in 6 M HCl at 30 °C.

AB - Amorphous WTi alloys were successfully prepared by DC magnetron sputtering in a wide composition range. The sputter deposited WTi alloys thus prepared were spontaneously passive, and their corrosion rates were lower than tungsten and about two orders of magnitude lower than titanium in 6 M HCl solution open to air at 30 °C. XPS analysis showed that tungsten was enriched in both the passive films and underlying alloy surfaces in 6 M HCl solution. The passive films on the WTi alloys were composed of a double oxyhydroxide of tetravalent tungsten and titanium ions. The formation of the double oxyhydroxide film seems responsible for high corrosion resistance of the alloys in comparison with alloying constituents in 6 M HCl at 30 °C.

UR - http://www.scopus.com/inward/record.url?scp=0029414208&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029414208&partnerID=8YFLogxK

U2 - 10.1016/0010-938X(95)00120-9

DO - 10.1016/0010-938X(95)00120-9

M3 - Article

AN - SCOPUS:0029414208

SN - 0010-938X

VL - 37

SP - 2071

EP - 2086

JO - Corrosion Science

JF - Corrosion Science

IS - 12

ER -

The corrosion behavior of sputter-deposited amorphous WTi alloys in 6 M HCl solution

Abstract

Access to Document

Other files and links

Fingerprint

Cite this