The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl solution

P. Y. Park; E. Akiyama; A. Kawashima; K. Asami; K. Hashimoto

doi:10.1016/0010-938X(96)00134-5

The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl solution

P. Y. Park, E. Akiyama, A. Kawashima, K. Asami, K. Hashimoto

Materials Design Division

Research output: Contribution to journal › Article › peer-review

38 Citations (Scopus)

Abstract

The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl at 30°C was investigated by electrochemical measurements and XPS analysis. The Mo-Ta alloys are composed of a single bcc solid solution. These alloys are spontaneously passive in 12 M HCl. The corrosion rate of low tantalum alloys is lower than that of molybdenum and comparable to that of tantalum. Their spontaneously passive film is rich in molybdenum. High tantalum alloys with 43 at% or more tantalum show a lower corrosion rate than tantalum and form spontaneously the tantalum-enriched passive film. Regardless of the concentrating cations in the spontaneously passivated film the concentration of tantalum decreases from the exterior to the interior of the film.

Original language	English
Pages (from-to)	397-411
Number of pages	15
Journal	Corrosion Science
Volume	38
Issue number	3
DOIs	https://doi.org/10.1016/0010-938X(96)00134-5
Publication status	Published - 1996 Mar

Keywords

A. alloy
A. sputtered films
B. XPS
C. passive films

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Materials Science(all)

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10.1016/0010-938X(96)00134-5

Cite this

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abstract = "The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl at 30°C was investigated by electrochemical measurements and XPS analysis. The Mo-Ta alloys are composed of a single bcc solid solution. These alloys are spontaneously passive in 12 M HCl. The corrosion rate of low tantalum alloys is lower than that of molybdenum and comparable to that of tantalum. Their spontaneously passive film is rich in molybdenum. High tantalum alloys with 43 at% or more tantalum show a lower corrosion rate than tantalum and form spontaneously the tantalum-enriched passive film. Regardless of the concentrating cations in the spontaneously passivated film the concentration of tantalum decreases from the exterior to the interior of the film.",

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AU - Akiyama, E.

AU - Kawashima, A.

AU - Asami, K.

AU - Hashimoto, K.

PY - 1996/3

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N2 - The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl at 30°C was investigated by electrochemical measurements and XPS analysis. The Mo-Ta alloys are composed of a single bcc solid solution. These alloys are spontaneously passive in 12 M HCl. The corrosion rate of low tantalum alloys is lower than that of molybdenum and comparable to that of tantalum. Their spontaneously passive film is rich in molybdenum. High tantalum alloys with 43 at% or more tantalum show a lower corrosion rate than tantalum and form spontaneously the tantalum-enriched passive film. Regardless of the concentrating cations in the spontaneously passivated film the concentration of tantalum decreases from the exterior to the interior of the film.

AB - The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl at 30°C was investigated by electrochemical measurements and XPS analysis. The Mo-Ta alloys are composed of a single bcc solid solution. These alloys are spontaneously passive in 12 M HCl. The corrosion rate of low tantalum alloys is lower than that of molybdenum and comparable to that of tantalum. Their spontaneously passive film is rich in molybdenum. High tantalum alloys with 43 at% or more tantalum show a lower corrosion rate than tantalum and form spontaneously the tantalum-enriched passive film. Regardless of the concentrating cations in the spontaneously passivated film the concentration of tantalum decreases from the exterior to the interior of the film.

KW - A. alloy

KW - A. sputtered films

KW - B. XPS

KW - C. passive films

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The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl solution

Abstract

Keywords

ASJC Scopus subject areas

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