TY - JOUR
T1 - The effect of frictional energy on uneven display of brightness in liquid crystal display
AU - Takegoshi, Masao
AU - Adachi, Koshi
AU - Kato, Koji
AU - Chen, Ning
N1 - Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.
PY - 2000/12
Y1 - 2000/12
N2 - Liquid crystal displays are commonly used recently, but productivity is not so satisfactorily high enough due to the occurrence of the uneven display of brightness. Based on our empirical study, these uneven display are believed to be caused by one of the most important processes, called rubbing process for liquid crystal display production. Since it was reported that frictional energy and rubbed area density are correlated closely with anchoring strength of liquid crystals, it was believed that fluctuation of frictional energy is the main reason for the occurrence of uneven display of brightness. In this research it was elucidated that the correlation between fluctuation of frictional energy and uneven display of brightness and proposed rubbing condition to prevent the occurrence of the uneven display of brightness.
AB - Liquid crystal displays are commonly used recently, but productivity is not so satisfactorily high enough due to the occurrence of the uneven display of brightness. Based on our empirical study, these uneven display are believed to be caused by one of the most important processes, called rubbing process for liquid crystal display production. Since it was reported that frictional energy and rubbed area density are correlated closely with anchoring strength of liquid crystals, it was believed that fluctuation of frictional energy is the main reason for the occurrence of uneven display of brightness. In this research it was elucidated that the correlation between fluctuation of frictional energy and uneven display of brightness and proposed rubbing condition to prevent the occurrence of the uneven display of brightness.
KW - Frictional energy
KW - Liquid crystal display
KW - Rubbing
KW - Rubbing cloth
KW - Uneven display of brightness
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U2 - 10.2493/jjspe.66.1875
DO - 10.2493/jjspe.66.1875
M3 - Article
AN - SCOPUS:30044436816
SN - 0912-0289
VL - 66
SP - 1875
EP - 1878
JO - Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
JF - Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
IS - 12
ER -