The electrical resistivity of epitaxially deposited chromium films

Masaki Sawabu, Masashi Ohashi, Kohei Ohashi, Masahiro Miyagawa, Takahide Kubota, Koki Takanashi

Research output: Contribution to journalConference articlepeer-review

4 Citations (Scopus)


We studied the electrical resistance and crystal structure of epitaxial chromium (Cr) films. The lattice constant of the Cr films is larger than that of the bulk Cr because the sample and the substrate MgO have different lattice constants. An chromium oxide layer having a thickness of 1 nm was found on all films from the result of X-ray reflectivity measurements. Although there is sample dependence in electric resistance of Cr films, it is remarkable that a zero resistance was observed for one film of 50 nm thick. TC is obtained to be 3.2 K, which is about twice the previous reports. The large upper critical field is obtained to be HC2 = 13 kOe, and it suggests that Cr may belongs to a type II superconductor.

Original languageEnglish
Article number012002
JournalJournal of Physics: Conference Series
Issue number1
Publication statusPublished - 2017 Jul 26
Event29th International Symposium on Superconductivity, ISS 2016 - Tokyo, Japan
Duration: 2016 Dec 132016 Dec 15

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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