TY - JOUR
T1 - Thermal and photochemical cleavage of Si=Si double bond in tetrasila-1,3-diene
AU - Uchiyama, Kei
AU - Nagendran, Selvarajan
AU - Ishida, Shintaro
AU - Iwamoto, Takeaki
AU - Kira, Mitsuo
PY - 2007/9/5
Y1 - 2007/9/5
N2 - A novel stable tetrasila-1,3-diene 3 was synthesized by the reduction with sodium of the corresponding 1,2,2-tribromodisilane. X-ray analysis shows that the tetrasila-1,3-diene skeleton of 3 is highly twisted but adopts an anticlinal conformation in contrast to the previously reported tetrasila-1,3-dienes showing a synclinal conformation. Upon heating at 80 °C or irradiation using filtered light (λ > 390 nm) of 3 in benzene, clean dissociation of one of the Si=Si double bonds of 3 occurred to give a novel cyclotrisilene 4 together with silylene 2 suggesting the initial Si=Si double bond dissociation of 3 to the corresponding disilenylsilylene 8 and silylene 2; cyclotrisilene 4 would be formed by the intramolecular silylene insertion into the Si=Si bond of 8.
AB - A novel stable tetrasila-1,3-diene 3 was synthesized by the reduction with sodium of the corresponding 1,2,2-tribromodisilane. X-ray analysis shows that the tetrasila-1,3-diene skeleton of 3 is highly twisted but adopts an anticlinal conformation in contrast to the previously reported tetrasila-1,3-dienes showing a synclinal conformation. Upon heating at 80 °C or irradiation using filtered light (λ > 390 nm) of 3 in benzene, clean dissociation of one of the Si=Si double bonds of 3 occurred to give a novel cyclotrisilene 4 together with silylene 2 suggesting the initial Si=Si double bond dissociation of 3 to the corresponding disilenylsilylene 8 and silylene 2; cyclotrisilene 4 would be formed by the intramolecular silylene insertion into the Si=Si bond of 8.
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U2 - 10.1021/ja0741473
DO - 10.1021/ja0741473
M3 - Article
AN - SCOPUS:35948932570
SN - 0002-7863
VL - 129
SP - 10638
EP - 10639
JO - Journal of the American Chemical Society
JF - Journal of the American Chemical Society
IS - 35
ER -