Thermal and photochemical cleavage of Si=Si double bond in tetrasila-1,3-diene

Kei Uchiyama, Selvarajan Nagendran, Shintaro Ishida, Takeaki Iwamoto, Mitsuo Kira

Research output: Contribution to journalArticlepeer-review

53 Citations (Scopus)


A novel stable tetrasila-1,3-diene 3 was synthesized by the reduction with sodium of the corresponding 1,2,2-tribromodisilane. X-ray analysis shows that the tetrasila-1,3-diene skeleton of 3 is highly twisted but adopts an anticlinal conformation in contrast to the previously reported tetrasila-1,3-dienes showing a synclinal conformation. Upon heating at 80 °C or irradiation using filtered light (λ > 390 nm) of 3 in benzene, clean dissociation of one of the Si=Si double bonds of 3 occurred to give a novel cyclotrisilene 4 together with silylene 2 suggesting the initial Si=Si double bond dissociation of 3 to the corresponding disilenylsilylene 8 and silylene 2; cyclotrisilene 4 would be formed by the intramolecular silylene insertion into the Si=Si bond of 8.

Original languageEnglish
Pages (from-to)10638-10639
Number of pages2
JournalJournal of the American Chemical Society
Issue number35
Publication statusPublished - 2007 Sept 5


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