Three-dimensionally controlled ion milling for reflection phase manipulation of EUV multilayer mirrors

T. Tsuru, T. Hatano, M. Yamamoto

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

For accurate nm-figure error correction of EUV multilayer mirror optics, a three-dimensionally controlled ion milling method was developed. To demonstrate the reflection phase manipulation of an EUV multilayer, 10 periods of a 40-period Mo/Si multilayer were partially removed. A partially milled Mo/Si multilayer with a contact double slit was successfully fabricated for interference fringe observations, which were carried out using a Young's EUV interferometer with a reflection configuration. The fringe pattern revealed a small reflection phase change after multilayer surface milling. EUV interferometry results demonstrated the effectiveness of the proposed method for sub-nanometer digital wavefront error correction in the case of multilayer mirror optics used in diffraction-limited imaging.

Original languageEnglish
Title of host publication10th International Conference on X-Ray Microscopy
Pages180-183
Number of pages4
DOIs
Publication statusPublished - 2010
Event10th International Conference on X-Ray Microscopy - Chicago, IL, United States
Duration: 2010 Aug 152010 Aug 20

Publication series

NameAIP Conference Proceedings
Volume1365
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference10th International Conference on X-Ray Microscopy
Country/TerritoryUnited States
CityChicago, IL
Period10/8/1510/8/20

Keywords

  • EUV multilayer
  • ion milling
  • phase correction
  • wavefront error

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