Tilt-insensitive film thickness measurement using a double twin-path interferometer

K. Hane; K. Yoneda; S. Hattori

doi:10.1016/0030-3992(85)90090-8

Tilt-insensitive film thickness measurement using a double twin-path interferometer

K. Hane, K. Yoneda, S. Hattori

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

Abstract

A lock-in amplifier detection method for measuring the film thickness on a flat substrate has been developed by using a common-path interferometer. The signal due to the film thickness has been obtained without it being affected by the tilting of the substrate. The sensitivity was better than 0.5 nm.

Original language	English
Pages (from-to)	208-212
Number of pages	5
Journal	Optics and Laser Technology
Volume	17
Issue number	4
DOIs	https://doi.org/10.1016/0030-3992(85)90090-8
Publication status	Published - 1985 Aug

Keywords

interferometry
thickness measurement
thin films

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10.1016/0030-3992(85)90090-8

Cite this

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title = "Tilt-insensitive film thickness measurement using a double twin-path interferometer",

abstract = "A lock-in amplifier detection method for measuring the film thickness on a flat substrate has been developed by using a common-path interferometer. The signal due to the film thickness has been obtained without it being affected by the tilting of the substrate. The sensitivity was better than 0.5 nm.",

keywords = "interferometry, thickness measurement, thin films",

author = "K. Hane and K. Yoneda and S. Hattori",

year = "1985",

month = aug,

doi = "10.1016/0030-3992(85)90090-8",

language = "English",

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journal = "Optics and Laser Technology",

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AU - Hane, K.

AU - Yoneda, K.

AU - Hattori, S.

PY - 1985/8

Y1 - 1985/8

N2 - A lock-in amplifier detection method for measuring the film thickness on a flat substrate has been developed by using a common-path interferometer. The signal due to the film thickness has been obtained without it being affected by the tilting of the substrate. The sensitivity was better than 0.5 nm.

AB - A lock-in amplifier detection method for measuring the film thickness on a flat substrate has been developed by using a common-path interferometer. The signal due to the film thickness has been obtained without it being affected by the tilting of the substrate. The sensitivity was better than 0.5 nm.

KW - interferometry

KW - thickness measurement

KW - thin films

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EP - 212

JO - Optics and Laser Technology

JF - Optics and Laser Technology

IS - 4

ER -

Tilt-insensitive film thickness measurement using a double twin-path interferometer

Abstract

Keywords

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