Top layer's thickness dependence on total electron-yield X-ray standing-wave

Takeo Ejima; Atsushi Yamazaki; Takanori Banse; Tadashi Hatano

doi:10.1016/j.elspec.2005.01.085

Top layer's thickness dependence on total electron-yield X-ray standing-wave

Takeo Ejima, Atsushi Yamazaki, Takanori Banse, Tadashi Hatano

SRIS - SR Core Research Division

Tohoku University

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.

Original language	English
Pages (from-to)	897-899
Number of pages	3
Journal	Journal of Electron Spectroscopy and Related Phenomena
Volume	144-147
DOIs	https://doi.org/10.1016/j.elspec.2005.01.085
Publication status	Published - 2005 Jun

Keywords

Multilayer
Standing wave
TEY-XSW
Thickness
Total electron yield

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10.1016/j.elspec.2005.01.085

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title = "Top layer's thickness dependence on total electron-yield X-ray standing-wave",

abstract = "A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.",

keywords = "Multilayer, Standing wave, TEY-XSW, Thickness, Total electron yield",

author = "Takeo Ejima and Atsushi Yamazaki and Takanori Banse and Tadashi Hatano",

year = "2005",

month = jun,

doi = "10.1016/j.elspec.2005.01.085",

language = "English",

volume = "144-147",

pages = "897--899",

journal = "Journal of Electron Spectroscopy and Related Phenomena",

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TY - JOUR

T1 - Top layer's thickness dependence on total electron-yield X-ray standing-wave

AU - Ejima, Takeo

AU - Yamazaki, Atsushi

AU - Banse, Takanori

AU - Hatano, Tadashi

PY - 2005/6

Y1 - 2005/6

N2 - A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.

AB - A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.

KW - Multilayer

KW - Standing wave

KW - TEY-XSW

KW - Thickness

KW - Total electron yield

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U2 - 10.1016/j.elspec.2005.01.085

DO - 10.1016/j.elspec.2005.01.085

M3 - Article

AN - SCOPUS:17444414228

SN - 0368-2048

VL - 144-147

SP - 897

EP - 899

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

ER -

Top layer's thickness dependence on total electron-yield X-ray standing-wave

Abstract

Keywords

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