Top layer's thickness dependence on total electron-yield X-ray standing-wave

Takeo Ejima, Atsushi Yamazaki, Takanori Banse, Tadashi Hatano

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.

Original languageEnglish
Pages (from-to)897-899
Number of pages3
JournalJournal of Electron Spectroscopy and Related Phenomena
Publication statusPublished - 2005 Jun


  • Multilayer
  • Standing wave
  • Thickness
  • Total electron yield


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