Transport of a helicon plasma by a convergent magnetic field for high speed and compact plasma etching

Kazunori Takahashi, Taisei Motomura, Akira Ando, Yuji Kasashima, Kazuya Kikunaga, Fumihiko Uesugi, Shiro Hara

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)


A high density argon plasma produced in a compact helicon source is transported by a convergent magnetic field to the central region of a substrate located downstream of the source. The magnetic field converging near the source exit is applied by a solenoid and further converged by installing a permanent magnet (PM) behind the substrate, which is located downstream of the source exit. Then a higher plasma density above 5 × 1012 cm-3 can be obtained in 0.2 Pa argon near the substrate, compared with the case without the PM. As no noticeable changes in the radially integrated density near the substrate and the power transfer efficiency are detected when testing the source with and without the PM, it can be deduced that the convergent field provided by the PM plays a role in constricting the plasma rather than in improving the plasma production. Furthermore it is applied to physical ion etching of silicon and aluminum substrates; then high etching rates of 6.5 μm min-1 and 8 μm min-1 are obtained, respectively.

Original languageEnglish
Article number425201
JournalJournal of Physics D: Applied Physics
Issue number42
Publication statusPublished - 2014 Oct 22


  • Convergent magnetic field
  • Helicon plasma
  • Plasma etching

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films


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