Two-way shape memory behavior of sputter-deposited Ni-rich Ni 2MnGa films

Makoto Ohtsuka, Minoru Matsumoto, Kimio Itagaki

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


The properties of the Ni-rich Ni2MnGa films and their shape memory behavior are investigated with respect to various sputtering conditions. The films are deposited on a poly-vinyl alcohol substrate with a radio-frequency magnetron sputtering apparatus using Ni50Mn25Ga 25 and Ni52Mn24Ga24 targets. The sputtering power is in the range of 50-400 W. After separating from the substrate, the films are vacuum-annealed at 1073 K for 3.6 ks. The chemical composition of the films depends on the sputtering power. The martensitic transformation temperature increases with the valence electron density of the films, while the Curie temperature slightly decreases. The film obtained with 50 W using the Ni50Mn25Ga25 target after heat treatment at 1073 K shows a two-way shape memory effect through the martensitic transformation and its reversion.

Original languageEnglish
Pages (from-to)1069-1074
Number of pages6
JournalJournal of Intelligent Material Systems and Structures
Issue number12
Publication statusPublished - 2006 Dec


  • Crystal structure
  • Ferromagnetic shape memory alloy
  • Martensitic transformation
  • Ni-Mn-Ga
  • Sputtered film
  • Two-way shape memory effect


Dive into the research topics of 'Two-way shape memory behavior of sputter-deposited Ni-rich Ni 2MnGa films'. Together they form a unique fingerprint.

Cite this