Abstract
An ultra-high-speed scaled-down self-aligned selective-epitaxial-growth (SEG) SiGe heterojunction bipolar transistor (HBT) was developed. This SiGe HBT has an ECL gate delay of 4.9 ps, and implemented in an ultra-high-speed static frequency divider, produces a maximum operating frequency of 81 GHz. It was indicated that this SiGe HBT technology will play an important role in ultra-high-speed optical-fiber-link systems and millimeter-wave communication systems.
Original language | English |
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Pages (from-to) | 767-770 |
Number of pages | 4 |
Journal | Technical Digest - International Electron Devices Meeting |
Publication status | Published - 2002 Dec 1 |
Externally published | Yes |
Event | 2002 IEEE International Devices Meeting (IEDM) - San Francisco, CA, United States Duration: 2002 Dec 8 → 2002 Dec 11 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry