TY - JOUR
T1 - Uniform electron cyclotron resonance plasma generation for precise ULSI Patterning
AU - Samukawa, Seiji
AU - Nakamura, Tsuyoshi
AU - Ishida, Toshinori
AU - Ishitani, Akihiko
PY - 1992/6
Y1 - 1992/6
N2 - Microwave perturbation results in lower microwave absorption because of plasma vibrations and pulses in an electron cyclotron resonance (ECR) plasma. Moreover, the parabolic 875 G equimagnetic field and the nonuniform magnetic field gradient causes nonuniform microwave absorption. Then, magnetohydrodynamic (MHD) plasma instability is generated in the ECR plasma. Accurate control of magnetic field profiles and microwave conditions for uniform and efficient microwave absorption is essential to the achievement of stable ECR plasma generation for precise anisotropic etching.
AB - Microwave perturbation results in lower microwave absorption because of plasma vibrations and pulses in an electron cyclotron resonance (ECR) plasma. Moreover, the parabolic 875 G equimagnetic field and the nonuniform magnetic field gradient causes nonuniform microwave absorption. Then, magnetohydrodynamic (MHD) plasma instability is generated in the ECR plasma. Accurate control of magnetic field profiles and microwave conditions for uniform and efficient microwave absorption is essential to the achievement of stable ECR plasma generation for precise anisotropic etching.
KW - Ecr plasma
KW - Magnetic field profiles
KW - Plasma instability
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U2 - 10.1143/JJAP.31.L774
DO - 10.1143/JJAP.31.L774
M3 - Article
AN - SCOPUS:84930742027
SN - 0021-4922
VL - 31
SP - L774-L776
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 6
ER -