Uniform electron cyclotron resonance plasma generation for precise ULSI Patterning

Seiji Samukawa, Tsuyoshi Nakamura, Toshinori Ishida, Akihiko Ishitani

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


Microwave perturbation results in lower microwave absorption because of plasma vibrations and pulses in an electron cyclotron resonance (ECR) plasma. Moreover, the parabolic 875 G equimagnetic field and the nonuniform magnetic field gradient causes nonuniform microwave absorption. Then, magnetohydrodynamic (MHD) plasma instability is generated in the ECR plasma. Accurate control of magnetic field profiles and microwave conditions for uniform and efficient microwave absorption is essential to the achievement of stable ECR plasma generation for precise anisotropic etching.

Original languageEnglish
Pages (from-to)L774-L776
JournalJapanese journal of applied physics
Issue number6
Publication statusPublished - 1992 Jun
Externally publishedYes


  • Ecr plasma
  • Magnetic field profiles
  • Plasma instability

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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