Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance

N. Sato; S. Iizuka; Y. Nakagawa; T. Tsukada

doi:10.1063/1.108661

Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance

N. Sato, S. Iizuka, Y. Nakagawa, T. Tsukada

ENG - Electrical Engineering

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28 Citations (Scopus)

Abstract

A uniform plasma is produced by a new plane slotted antenna with permanent magnets for the electron cyclotron resonance. The plasma is uniform within a few percent in a diameter of 25-30 cm at a distance of 25-30 cm from the antenna. The plasma density, 1.5×10¹⁰ cm^-3 with electron temperature of 1.8 eV at a microwave power of 100 W, is almost proportional to the microwave power. A magnetic distribution provided by the magnets is essential for producing such a uniform plasma.

Original language	English
Pages (from-to)	1469-1471
Number of pages	3
Journal	Applied Physics Letters
Volume	62
Issue number	13
DOIs	https://doi.org/10.1063/1.108661
Publication status	Published - 1993

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.108661

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title = "Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance",

abstract = "A uniform plasma is produced by a new plane slotted antenna with permanent magnets for the electron cyclotron resonance. The plasma is uniform within a few percent in a diameter of 25-30 cm at a distance of 25-30 cm from the antenna. The plasma density, 1.5×1010 cm-3 with electron temperature of 1.8 eV at a microwave power of 100 W, is almost proportional to the microwave power. A magnetic distribution provided by the magnets is essential for producing such a uniform plasma.",

author = "N. Sato and S. Iizuka and Y. Nakagawa and T. Tsukada",

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doi = "10.1063/1.108661",

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AU - Sato, N.

AU - Iizuka, S.

AU - Nakagawa, Y.

AU - Tsukada, T.

PY - 1993

Y1 - 1993

N2 - A uniform plasma is produced by a new plane slotted antenna with permanent magnets for the electron cyclotron resonance. The plasma is uniform within a few percent in a diameter of 25-30 cm at a distance of 25-30 cm from the antenna. The plasma density, 1.5×1010 cm-3 with electron temperature of 1.8 eV at a microwave power of 100 W, is almost proportional to the microwave power. A magnetic distribution provided by the magnets is essential for producing such a uniform plasma.

AB - A uniform plasma is produced by a new plane slotted antenna with permanent magnets for the electron cyclotron resonance. The plasma is uniform within a few percent in a diameter of 25-30 cm at a distance of 25-30 cm from the antenna. The plasma density, 1.5×1010 cm-3 with electron temperature of 1.8 eV at a microwave power of 100 W, is almost proportional to the microwave power. A magnetic distribution provided by the magnets is essential for producing such a uniform plasma.

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ER -

Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance

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