UV/VIS/NIR imaging technologies: Challenges and opportunities

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


Challenges and opportunities of ultraviolet (UV), visible (VIS) and near-infrared (NIR) light imaging technologies are overviewed in this paper. For light detectors and image sensors for UV/VIS/NIR imaging, it is required that they have high sensitivity for wide spectral light waveband or targeted narrow waveband as well as the high stability of light sensitivity toward UV light based on cost effective technology. Wide spectral response, high sensitivity and high stability advanced Si photodiode (PD) pn junction formation technology based on the flattened Si surface and high transmittance on-chip optical filter formation technology were developed. A linear photodiode array (PDA), wide dynamic range and ultrahigh speed CMOS image sensors employing the developed technology were fabricated and their.

Original languageEnglish
Title of host publicationImage Sensing Technologies
Subtitle of host publicationMaterials, Devices, Systems, and Applications II
EditorsAchyut K. Dutta, Nibir K. Dhar
ISBN (Electronic)9781628415971
Publication statusPublished - 2015
EventImage Sensing Technologies: Materials, Devices, Systems, and Applications II - Baltimore, United States
Duration: 2015 Apr 222015 Apr 23

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceImage Sensing Technologies: Materials, Devices, Systems, and Applications II
Country/TerritoryUnited States


  • Image sensor
  • Si
  • Ultraviolet light
  • Visible light near-infrared light


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