TY - JOUR
T1 - Visible absorption properties of retinoic acid controlled on hydrogenated amorphous silicon thin film
AU - Tsujiuchi, Yutaka
AU - Masumoto, Hiroshi
AU - Goto, Takashi
PY - 2008/2/15
Y1 - 2008/2/15
N2 - Langmuir-Blodgett (LB) films of retinoic acid and LB films of retinoic acid mixed with a peptide that contains an alaninelysine-valine (AKV) amino acid sequence deposited on a hydrogenated amorphous silicon (a-Si:H) film prepared by electron cyclotron resonance (ECR) plasma sputtering were fabricated, and their light absorption spectrums were compared. A specific visible light absorption at approximately 500nm occurred in a film that had a film thickness of more than 80nm and a hydrogen concentration of more than 20% in the sputtering process gas. Mixing the AKV sequence peptide with retinoic acid caused a 6 nm blueshift, from 363 to 357 nm, of the absorption maximum of the composite LB film on a SiO2 substrate. Using the same peptide, a large 30 nm blueshift, from 500 to 470 nm, was induced in the composite LB film on the a-Si:H film.
AB - Langmuir-Blodgett (LB) films of retinoic acid and LB films of retinoic acid mixed with a peptide that contains an alaninelysine-valine (AKV) amino acid sequence deposited on a hydrogenated amorphous silicon (a-Si:H) film prepared by electron cyclotron resonance (ECR) plasma sputtering were fabricated, and their light absorption spectrums were compared. A specific visible light absorption at approximately 500nm occurred in a film that had a film thickness of more than 80nm and a hydrogen concentration of more than 20% in the sputtering process gas. Mixing the AKV sequence peptide with retinoic acid caused a 6 nm blueshift, from 363 to 357 nm, of the absorption maximum of the composite LB film on a SiO2 substrate. Using the same peptide, a large 30 nm blueshift, from 500 to 470 nm, was induced in the composite LB film on the a-Si:H film.
KW - Amino acid
KW - ECR plasma sputtering
KW - Hydrogenated amorphous silicon
KW - Langmuir-Blodgett film
KW - Retinoic acid
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U2 - 10.1143/JJAP.47.1211
DO - 10.1143/JJAP.47.1211
M3 - Article
AN - SCOPUS:54249144682
SN - 0021-4922
VL - 47
SP - 1211
EP - 1214
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 2 PART 2
ER -