Water adsorption on α-Fe2O3 (0001) at near ambient conditions

Susumu Yamamoto; Tom Kendelewicz; John T. Newberg; Guido Ketteler; David E. Starr; Erin R. Mysak; Klas J. Andersson; Hirohito Ogasawara; Hendrik Bluhm; Miquel Salmeron; Gordon E. Brown; Anders Nilsson

doi:10.1021/jp909876t

Water adsorption on α-Fe₂O₃ (0001) at near ambient conditions

Susumu Yamamoto, Tom Kendelewicz, John T. Newberg, Guido Ketteler, David E. Starr, Erin R. Mysak, Klas J. Andersson, Hirohito Ogasawara, Hendrik Bluhm, Miquel Salmeron, Gordon E. Brown, Anders Nilsson

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228 Citations (Scopus)

Abstract

We have investigated hydroxylation and water adsorption on α Fe ₂O₃(0001) at water vapor pressures up to 2 Torr and temperatures ranging from 277 to 647 K (relative humidity (RH) < 34%) using ambient-pressure X-ray photoelectron spectroscopy (XPS). Hydroxylation occurs at the very low RH of 1 × 10^-7 % and precedes the adsorption of molecular water. With increasing RH, the OH coverage increases up to one monolayer (ML) without any distinct threshold pressure. Depth profiling measurements showed that hydroxylation occurs only at the topmost surface under our experimental conditions. The onset of molecular water adsorption varies from ∼2 ×10^-5 to ∼4 ?10^-2 % RH depending on sample temperature and water vapor pressure. The coverage of water reaches 1 ML at ∼15% RH and increases to 1.5 ML at 34% RH.

Original language	English
Pages (from-to)	2256-2266
Number of pages	11
Journal	Journal of Physical Chemistry C
Volume	114
Issue number	5
DOIs	https://doi.org/10.1021/jp909876t
Publication status	Published - 2010 Feb 11

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title = "Water adsorption on α-Fe2O3 (0001) at near ambient conditions",

abstract = "We have investigated hydroxylation and water adsorption on α Fe 2O3(0001) at water vapor pressures up to 2 Torr and temperatures ranging from 277 to 647 K (relative humidity (RH) < 34%) using ambient-pressure X-ray photoelectron spectroscopy (XPS). Hydroxylation occurs at the very low RH of 1 × 10-7 % and precedes the adsorption of molecular water. With increasing RH, the OH coverage increases up to one monolayer (ML) without any distinct threshold pressure. Depth profiling measurements showed that hydroxylation occurs only at the topmost surface under our experimental conditions. The onset of molecular water adsorption varies from ∼2 ×10-5 to ∼4 ?10-2 % RH depending on sample temperature and water vapor pressure. The coverage of water reaches 1 ML at ∼15% RH and increases to 1.5 ML at 34% RH.",

author = "Susumu Yamamoto and Tom Kendelewicz and Newberg, {John T.} and Guido Ketteler and Starr, {David E.} and Mysak, {Erin R.} and Andersson, {Klas J.} and Hirohito Ogasawara and Hendrik Bluhm and Miquel Salmeron and Brown, {Gordon E.} and Anders Nilsson",

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doi = "10.1021/jp909876t",

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T1 - Water adsorption on α-Fe2O3 (0001) at near ambient conditions

AU - Yamamoto, Susumu

AU - Kendelewicz, Tom

AU - Newberg, John T.

AU - Ketteler, Guido

AU - Starr, David E.

AU - Mysak, Erin R.

AU - Andersson, Klas J.

AU - Ogasawara, Hirohito

AU - Bluhm, Hendrik

AU - Salmeron, Miquel

AU - Brown, Gordon E.

AU - Nilsson, Anders

PY - 2010/2/11

Y1 - 2010/2/11

N2 - We have investigated hydroxylation and water adsorption on α Fe 2O3(0001) at water vapor pressures up to 2 Torr and temperatures ranging from 277 to 647 K (relative humidity (RH) < 34%) using ambient-pressure X-ray photoelectron spectroscopy (XPS). Hydroxylation occurs at the very low RH of 1 × 10-7 % and precedes the adsorption of molecular water. With increasing RH, the OH coverage increases up to one monolayer (ML) without any distinct threshold pressure. Depth profiling measurements showed that hydroxylation occurs only at the topmost surface under our experimental conditions. The onset of molecular water adsorption varies from ∼2 ×10-5 to ∼4 ?10-2 % RH depending on sample temperature and water vapor pressure. The coverage of water reaches 1 ML at ∼15% RH and increases to 1.5 ML at 34% RH.

AB - We have investigated hydroxylation and water adsorption on α Fe 2O3(0001) at water vapor pressures up to 2 Torr and temperatures ranging from 277 to 647 K (relative humidity (RH) < 34%) using ambient-pressure X-ray photoelectron spectroscopy (XPS). Hydroxylation occurs at the very low RH of 1 × 10-7 % and precedes the adsorption of molecular water. With increasing RH, the OH coverage increases up to one monolayer (ML) without any distinct threshold pressure. Depth profiling measurements showed that hydroxylation occurs only at the topmost surface under our experimental conditions. The onset of molecular water adsorption varies from ∼2 ×10-5 to ∼4 ?10-2 % RH depending on sample temperature and water vapor pressure. The coverage of water reaches 1 ML at ∼15% RH and increases to 1.5 ML at 34% RH.

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JF - Journal of Physical Chemistry C

IS - 5

ER -

Water adsorption on α-Fe₂O₃ (0001) at near ambient conditions

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