TY - JOUR
T1 - Wide range reflection multilayer in 200-25 nm region for Schwarzschild objectives
AU - Ejima, T.
AU - Sudo, K.
AU - Hatano, T.
AU - Watanabe, M.
PY - 2003/3
Y1 - 2003/3
N2 - Preliminary results of a wide range reflection multilayer in a range from 200 nm to 25 nm (6 eV to 50 eV) for normal incidence are reported. The structure of the multilayer is [SiC (6.0 nm)](top single layer)/[Y2O3(5.0 nm)/Mg(12.5 nm)/Y2O3(3.3 nm)/Mg(10.0 nm)](middle-aperiodic layers)/[Y2O3(3.0 nm)/Mg(9.9 nm)]×15 (piled-double-layers). Its normal incidence reflectance was more than 0.25 in 220 - 115 nm region and more than 0.04 in 34 - 24 nm region.
AB - Preliminary results of a wide range reflection multilayer in a range from 200 nm to 25 nm (6 eV to 50 eV) for normal incidence are reported. The structure of the multilayer is [SiC (6.0 nm)](top single layer)/[Y2O3(5.0 nm)/Mg(12.5 nm)/Y2O3(3.3 nm)/Mg(10.0 nm)](middle-aperiodic layers)/[Y2O3(3.0 nm)/Mg(9.9 nm)]×15 (piled-double-layers). Its normal incidence reflectance was more than 0.25 in 220 - 115 nm region and more than 0.04 in 34 - 24 nm region.
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U2 - 10.1051/jp4:200300075
DO - 10.1051/jp4:200300075
M3 - Conference article
AN - SCOPUS:0038702239
SN - 1155-4339
VL - 104
SP - 259
EP - 262
JO - Journal De Physique. IV : JP
JF - Journal De Physique. IV : JP
T2 - 7th International Conference on X-Ray Microscopy
Y2 - 28 July 2002 through 2 August 2002
ER -