Work-function engineering for 32-nm-node pMOS devices: High-performance TaCNO-gated films

Barry J. O'Sullivan, Riichirou Mitsuhashi, Satoru Ito, Kota Oikawa, Stefan Kubicek, Vasile Paraschiv, Christoph Adelmann, Anabela Veloso, Hong Yu, Tom Schram, Serge Biesemans, T. Nakabayashi, Atsushi Ikeda, Masaaki Niwa

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

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