TY - JOUR
T1 - X-ray diffraction and X-ray photoelectron spectra of Fe-Cr-N films deposited by DC reactive sputtering
AU - Peng, D. L.
AU - Sumiyama, K.
AU - Oku, M.
AU - Konno, T. J.
AU - Wagatsuma, K.
AU - Suzuki, K.
N1 - Funding Information:
The authors express their appreciation to Dr. T. Takada and Mr. Y Murakami for their support of the chemical analysis. One of the author (D. L. Peng) appreciates the financial support from the Ministry of Education, Science, Culture and Sport, Japan. This work was also partially supported by Grant-in-Aid for General Scientific Research (No. 08405043) given by the Ministry of Education, Science, Culture and Sport, Japan.
PY - 1999/1/1
Y1 - 1999/1/1
N2 - The effects of nitrogen flow ratio, target area ratio of Cr, and substrate temperature on the structure of DC reactive sputtered Fe-Cr-N ternary films have been studied. X-ray diffraction measurements show that Fe-Cr-N films consist of α-Fe(Cr) and γ′-(Fe,Cr)4Nx (x < 1) phases. The crystal grain of the α-Fe(Cr) phase becomes finer and a (200) texture of the γ′-(Fe,Cr)4Nx phase becomes more marked with increasing the nitrogen flow ratio. X-ray photoelectron spectra of the films show that oxidation resistance of Fe-Cr-N films is superior to that of Fe-N films, and oxides are formed only in the film surface due to contacting with the ambient atmosphere and oxygen contamination is very small in the inner parts of these films.
AB - The effects of nitrogen flow ratio, target area ratio of Cr, and substrate temperature on the structure of DC reactive sputtered Fe-Cr-N ternary films have been studied. X-ray diffraction measurements show that Fe-Cr-N films consist of α-Fe(Cr) and γ′-(Fe,Cr)4Nx (x < 1) phases. The crystal grain of the α-Fe(Cr) phase becomes finer and a (200) texture of the γ′-(Fe,Cr)4Nx phase becomes more marked with increasing the nitrogen flow ratio. X-ray photoelectron spectra of the films show that oxidation resistance of Fe-Cr-N films is superior to that of Fe-N films, and oxides are formed only in the film surface due to contacting with the ambient atmosphere and oxygen contamination is very small in the inner parts of these films.
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U2 - 10.1023/A:1004638700680
DO - 10.1023/A:1004638700680
M3 - Article
AN - SCOPUS:0033189844
SN - 0022-2461
VL - 34
SP - 4623
EP - 4628
JO - Journal of Materials Science
JF - Journal of Materials Science
IS - 18
ER -