X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials

Yuichi Setsuhara; Ken Cho; Masaharu Shiratani; Makoto Sekine; Masaru Hori

doi:10.1016/j.tsf.2010.01.057

X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Institute for Materials Research (IMR)

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

Plasma-polymer interactions have been investigated using atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS) of polyethyleneterephthalate (PET) films, which have been exposed to argon plasmas driven by low-inductance antenna modules as a parameter of ion energy. The AFM images indicated that the argon plasma exposure exhibited a significant change in surface roughness. The XPS analyses suggested that the degradation of chemical bonding structure and/or bond scission of PET could be effectively suppressed in the plasma exposures with ion energies below 6 eV. However, significant degradations of O = C-O bond, C-O bond and phenyl group were observed with increasing ion energy above 6 eV.

Original language	English
Pages (from-to)	6492-6495
Number of pages	4
Journal	Thin Solid Films
Volume	518
Issue number	22
DOIs	https://doi.org/10.1016/j.tsf.2010.01.057
Publication status	Published - 2010 Sept 1

Keywords

Inductively-coupled plasma
Low-damage process
Low-inductance antenna
Polymer
X-ray photoelectron spectroscopy

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2010.01.057

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title = "X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials",

abstract = "Plasma-polymer interactions have been investigated using atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS) of polyethyleneterephthalate (PET) films, which have been exposed to argon plasmas driven by low-inductance antenna modules as a parameter of ion energy. The AFM images indicated that the argon plasma exposure exhibited a significant change in surface roughness. The XPS analyses suggested that the degradation of chemical bonding structure and/or bond scission of PET could be effectively suppressed in the plasma exposures with ion energies below 6 eV. However, significant degradations of O = C-O bond, C-O bond and phenyl group were observed with increasing ion energy above 6 eV.",

keywords = "Inductively-coupled plasma, Low-damage process, Low-inductance antenna, Polymer, X-ray photoelectron spectroscopy",

author = "Yuichi Setsuhara and Ken Cho and Masaharu Shiratani and Makoto Sekine and Masaru Hori",

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T1 - X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials

AU - Setsuhara, Yuichi

AU - Cho, Ken

AU - Shiratani, Masaharu

AU - Sekine, Makoto

AU - Hori, Masaru

PY - 2010/9/1

Y1 - 2010/9/1

N2 - Plasma-polymer interactions have been investigated using atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS) of polyethyleneterephthalate (PET) films, which have been exposed to argon plasmas driven by low-inductance antenna modules as a parameter of ion energy. The AFM images indicated that the argon plasma exposure exhibited a significant change in surface roughness. The XPS analyses suggested that the degradation of chemical bonding structure and/or bond scission of PET could be effectively suppressed in the plasma exposures with ion energies below 6 eV. However, significant degradations of O = C-O bond, C-O bond and phenyl group were observed with increasing ion energy above 6 eV.

AB - Plasma-polymer interactions have been investigated using atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS) of polyethyleneterephthalate (PET) films, which have been exposed to argon plasmas driven by low-inductance antenna modules as a parameter of ion energy. The AFM images indicated that the argon plasma exposure exhibited a significant change in surface roughness. The XPS analyses suggested that the degradation of chemical bonding structure and/or bond scission of PET could be effectively suppressed in the plasma exposures with ion energies below 6 eV. However, significant degradations of O = C-O bond, C-O bond and phenyl group were observed with increasing ion energy above 6 eV.

KW - Inductively-coupled plasma

KW - Low-damage process

KW - Low-inductance antenna

KW - Polymer

KW - X-ray photoelectron spectroscopy

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X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials

Abstract

Keywords

ASJC Scopus subject areas

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