品田 賢宏

研究成果

年別の研究成果 1997 2000 2006 2011 2013 2015 2017 2022

• 31 Article
• 24 Conference contribution
• 6 Conference article
• 3 Chapter
• 6 その他
  • 2 Book
  • 2 Foreword/postscript
  • 1 Editorial
  • 1 Letter

年別の研究成果

年別の研究成果

検索結果

• 2017

  Deterministic single-ion implantation method for quantum processing in silicon and diamond

  Shinada, T., Prati, E. & Tanii, T., 2017 1月 1, Integrated Nanodevice and Nanosystem Fabrication: Breakthroughs and Alternatives. Pan Stanford Publishing Pte. Ltd., p. 3-26 24 p.

  研究成果: Chapter

  • Doping (Additives) 100%
  • Material 44%
  • Silicon 44%
  • Ion Implantation 33%
  • Transistor 33%
• 2013

  Deterministic Single-Ion Implantation Method for Extending CMOS Technologies

  Shinada, T., 2013 1月 1, Single-Atom Nanoelectronics. Pan Stanford Publishing Pte. Ltd., p. 89-118 30 p.

  研究成果: Chapter

  • Transistor 100%
  • Dopants 50%
  • Doping (Additives) 50%
  • Ion Implantation 33%
  • Essential Requirement 16%

• Quantum Information in Silicon Devices Based on Individual Dopants

  Prati, E. & Shinada, T., 2013 1月 1, Single-Atom Nanoelectronics. Pan Stanford Publishing Pte. Ltd., p. 5-40 36 p.

  研究成果: Chapter

  • Quantum Information 100%
  • Silicon 25%
  • Semiconductor 12%
  • Solid State 12%
  • Fabrication 12%
  5 被引用数 (Scopus)