水素ラジカル処理した銅表面の x 線光電子分光法（xps）による酸化挙動解析

Seongbin Shin; Eiji Higurashi; Kohta Furuyama; Michitaka Yamamoto; Tadatomo Suga

doi:10.1541/ieejsmas.139.38

水素ラジカル処理した銅表面の x 線光電子分光法（xps）による酸化挙動解析

Seongbin Shin, Eiji Higurashi, Kohta Furuyama, Michitaka Yamamoto, Tadatomo Suga

工学研究科・電子工学専攻

The University of Tokyo

研究成果: ジャーナルへの寄稿 › 学術論文 › 査読

抄録

Hydrogen radical and argon fast atom beam (FAB) treatments were used to remove the oxide layer of copper metal. After the treatments, the copper samples were exposed to air atmosphere (~4 h) at room temperature to evaluate the re-oxidation behavior. Compared to argon FAB treatment, hydrogen radical treatment promotes the formation of copper hydroxide [Cu(OH) ₂ ] and suppresses the formation of cuprous oxide (Cu ₂ O) formation.

寄稿の翻訳タイトル	X-ray Photoelectron Spectroscopy (XPS) Analysis of Oxidation Behavior of Hydrogen-radical-treated Cu Surfaces
本文言語	Japanese
ページ（範囲）	38-39
ページ数	2
ジャーナル	IEEJ Transactions on Sensors and Micromachines
巻	139
号	2
DOI	https://doi.org/10.1541/ieejsmas.139.38
出版ステータス	出版済み - 2019

キーワード

Copper
Hydrogen radical
Oxidation
X-ray photoelectron spectroscopy

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10.1541/ieejsmas.139.38

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title = "水素ラジカル処理した銅表面の x 線光電子分光法（xps）による酸化挙動解析",

abstract = " Hydrogen radical and argon fast atom beam (FAB) treatments were used to remove the oxide layer of copper metal. After the treatments, the copper samples were exposed to air atmosphere (\textasciitilde{}4 h) at room temperature to evaluate the re-oxidation behavior. Compared to argon FAB treatment, hydrogen radical treatment promotes the formation of copper hydroxide [Cu(OH) 2 ] and suppresses the formation of cuprous oxide (Cu 2 O) formation.",

keywords = "Copper, Hydrogen radical, Oxidation, X-ray photoelectron spectroscopy",

author = "Seongbin Shin and Eiji Higurashi and Kohta Furuyama and Michitaka Yamamoto and Tadatomo Suga",

note = "Publisher Copyright: {\textcopyright} 2019 The Institute of Electrical Engineers of Japan.",

year = "2019",

doi = "10.1541/ieejsmas.139.38",

language = "Japanese",

volume = "139",

pages = "38--39",

journal = "IEEJ Transactions on Sensors and Micromachines",

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publisher = "The Institute of Electrical Engineers of Japan",

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TY - JOUR

T1 - 水素ラジカル処理した銅表面の x 線光電子分光法（xps）による酸化挙動解析

AU - Shin, Seongbin

AU - Higurashi, Eiji

AU - Furuyama, Kohta

AU - Yamamoto, Michitaka

AU - Suga, Tadatomo

PY - 2019

Y1 - 2019

N2 - Hydrogen radical and argon fast atom beam (FAB) treatments were used to remove the oxide layer of copper metal. After the treatments, the copper samples were exposed to air atmosphere (~4 h) at room temperature to evaluate the re-oxidation behavior. Compared to argon FAB treatment, hydrogen radical treatment promotes the formation of copper hydroxide [Cu(OH) 2 ] and suppresses the formation of cuprous oxide (Cu 2 O) formation.

AB - Hydrogen radical and argon fast atom beam (FAB) treatments were used to remove the oxide layer of copper metal. After the treatments, the copper samples were exposed to air atmosphere (~4 h) at room temperature to evaluate the re-oxidation behavior. Compared to argon FAB treatment, hydrogen radical treatment promotes the formation of copper hydroxide [Cu(OH) 2 ] and suppresses the formation of cuprous oxide (Cu 2 O) formation.

KW - Copper

KW - Hydrogen radical

KW - Oxidation

KW - X-ray photoelectron spectroscopy

UR - https://www.scopus.com/pages/publications/85061290792

UR - https://www.scopus.com/inward/citedby.url?scp=85061290792&partnerID=8YFLogxK

U2 - 10.1541/ieejsmas.139.38

DO - 10.1541/ieejsmas.139.38

M3 - 学術論文

AN - SCOPUS:85061290792

SN - 1341-8939

VL - 139

SP - 38

EP - 39

JO - IEEJ Transactions on Sensors and Micromachines

JF - IEEJ Transactions on Sensors and Micromachines

IS - 2

ER -

水素ラジカル処理した銅表面の x 線光電子分光法（xps）による酸化挙動解析

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