10 cm diameter mono cast Si growth and its characterization

Y. Miyamura, H. Harada, K. Jiptner, J. Chen, R. R. Prakash, J. Y. Li, T. Sekiguchi, T. Kojima, Y. Ohshita, A. Ogura, M. Fukuzawa, S. Nakano, B. Gao, K. Kakimoto

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

To get the optimized condition and ideal furnace structure, we have performed seed cast growth of mono-crystalline Si by using a unidirectional solidification furnace. More than 20 ingots of 10 cm diameter and 10 cm height were grown under different growth conditions. The quality of ingots was characterized by using Fourier transform infrared spectroscopy (FTIR), infrared microscopy, scanning infrared polariscope (SIRP), X-ray topography. We have realized reduction of carbon, residual strain and extended defects, which may contribute the increase of solar cell efficiency.

本文言語English
ホスト出版物のタイトルGettering and Defect Engineering in Semiconductor Technology XV
出版社Trans Tech Publications Ltd
ページ89-93
ページ数5
ISBN(印刷版)9783037858240
DOI
出版ステータスPublished - 2014
外部発表はい
イベント15th Gettering and Defect Engineering in Semiconductor Technology, GADEST 2013 - Oxford, United Kingdom
継続期間: 2013 9月 222013 9月 27

出版物シリーズ

名前Solid State Phenomena
205-206
ISSN(印刷版)1012-0394

Conference

Conference15th Gettering and Defect Engineering in Semiconductor Technology, GADEST 2013
国/地域United Kingdom
CityOxford
Period13/9/2213/9/27

ASJC Scopus subject areas

  • 原子分子物理学および光学
  • 材料科学(全般)
  • 凝縮系物理学

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