2H-SiC films grown by laser chemical vapor deposition

Akihiko Ito, Hitoshi Kanno, Takashi Goto

研究成果: Article査読

15 被引用数 (Scopus)

抄録

We demonstrated the synthesis of 2H-SiC films on graphite and (0001) sapphire substrates by laser chemical vapor deposition. A tris(dimethylamino) silane was used as a novel precursor for the synthesis of SiC films in a CH4 atmosphere. The 2H-SiC films were obtained at a deposition temperature of 920K on the sapphire substrate. The films comprised a-axis-oriented columnar grains and their in-plane orientation relationship was [1000] 2H-SiC // [0001] sapphire and [0001] 2H-SiC // [1000] sapphire. The films were deposited at the rate of 182μmh-1.

本文言語English
論文番号10252
ページ(範囲)4611-4615
ページ数5
ジャーナルJournal of the European Ceramic Society
35
16
DOI
出版ステータスPublished - 2015 12月

ASJC Scopus subject areas

  • セラミックおよび複合材料
  • 材料化学

フィンガープリント

「2H-SiC films grown by laser chemical vapor deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル