TY - GEN
T1 - A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems
AU - Higo, Akio
AU - Takahashi, K.
AU - Fujita, H.
AU - Nakano, Y.
AU - Toshiyoshi, H.
PY - 2009
Y1 - 2009
N2 - We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.
AB - We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.
KW - HF vapor protection
KW - HF vapor release technique
KW - Parylene
UR - http://www.scopus.com/inward/record.url?scp=71449099554&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=71449099554&partnerID=8YFLogxK
U2 - 10.1109/SENSOR.2009.5285531
DO - 10.1109/SENSOR.2009.5285531
M3 - Conference contribution
AN - SCOPUS:71449099554
SN - 9781424441938
T3 - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
SP - 196
EP - 199
BT - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
T2 - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Y2 - 21 June 2009 through 25 June 2009
ER -