An interferometric self-calibration method for the evaluation of the pitch deviation of scale grating has been extended to evaluate the pitch deviation of the long-range type linear scale by utilizing the stitching interferometry technique. Following the previous work, in which the interferometric self-calibration method was proposed to assess the pitch deviation of the scale grating by combing the first-order diffracted beams from the grating, a stitching calibration method is proposed to enlarge the measurement range. Theoretical analysis is performed to realize the X-directional pitch deviation calibration of the long-range linear scale while reducing the second-order accumulation effect by canceling the influence of the reference flat error in the sub-apertures’ measurements. In this paper, the stitching interferometry theory is briefly reviewed, and theoretical equations of the X-directional pitch deviation stitching are derived for evaluation of the pitch deviation of the long-range linear scale. Followed by the simulation verification, some experiments with a linear scale of 105 mm length from a commercial interferential scanning-type optical encoder are conducted to verify the feasibility of the self-calibration stitching method for the calibration of the X-directional pitch deviation of the linear scale over its whole area.
|出版ステータス||Published - 2021 11月 1|
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