Applications of polysilanes for a negative-tone resist in ion beam lithography

Yoshinori Matsui; Shu Seki; Satoshi Tsukuda; Takahiro Kozawa; Seiichi Tagawa

doi:10.1109/IMNC.2003.1268598

Applications of polysilanes for a negative-tone resist in ion beam lithography

Yoshinori Matsui, Shu Seki, Satoshi Tsukuda, Takahiro Kozawa, Seiichi Tagawa

研究成果: Conference contribution

抄録

In this paper, we investigated polysilanes as negative-tone resists for FIB lithography.

本文言語	English
ホスト出版物のタイトル	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
出版社	Institute of Electrical and Electronics Engineers Inc.
ページ	106-107
ページ数	2
ISBN（電子版）	4891140402, 9784891140403
DOI	https://doi.org/10.1109/IMNC.2003.1268598
出版ステータス	Published - 2003
外部発表	はい
イベント	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan 継続期間: 2003 10月 29 → 2003 10月 31

出版物シリーズ

名前	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Other

Other	International Microprocesses and Nanotechnology Conference, MNC 2003
国/地域	Japan
City	Tokyo
Period	03/10/29 → 03/10/31

ASJC Scopus subject areas

ハードウェアとアーキテクチャ
電子工学および電気工学

文献へのアクセス

10.1109/IMNC.2003.1268598

他のファイルとリンク

引用スタイル

Matsui, Y., Seki, S., Tsukuda, S., Kozawa, T., & Tagawa, S. (2003). Applications of polysilanes for a negative-tone resist in ion beam lithography. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 106-107). [1268598] (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268598

Applications of polysilanes for a negative-tone resist in ion beam lithography. / Matsui, Yoshinori; Seki, Shu; Tsukuda, Satoshi その他.
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 106-107 1268598 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

研究成果: Conference contribution

Matsui, Y, Seki, S, Tsukuda, S, Kozawa, T & Tagawa, S 2003, Applications of polysilanes for a negative-tone resist in ion beam lithography. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268598, Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, Institute of Electrical and Electronics Engineers Inc., pp. 106-107, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 03/10/29. https://doi.org/10.1109/IMNC.2003.1268598

Matsui Y, Seki S, Tsukuda S, Kozawa T, Tagawa S. Applications of polysilanes for a negative-tone resist in ion beam lithography. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 106-107. 1268598. (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). doi: 10.1109/IMNC.2003.1268598

Matsui, Yoshinori ; Seki, Shu ; Tsukuda, Satoshi その他. / Applications of polysilanes for a negative-tone resist in ion beam lithography. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 106-107 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

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author = "Yoshinori Matsui and Shu Seki and Satoshi Tsukuda and Takahiro Kozawa and Seiichi Tagawa",

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Applications of polysilanes for a negative-tone resist in ion beam lithography

抄録

出版物シリーズ

Other

ASJC Scopus subject areas

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